EP 1320857 A2 20030625 - ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
Title (en)
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
Title (de)
BELEUCHTUNGSSYSTEM INSBESONDERE FÜR MIKROLITHOGRAPHIE
Title (fr)
SYSTEME D'ECLAIRAGE, EN PARTICULIER POUR LA MICROLITHOGRAPHIE
Publication
Application
Priority
- DE 20100123 U 20010105
- DE 10100265 A 20010108
- EP 0111224 W 20010928
- US 67971800 A 20000929
Abstract (en)
[origin: WO0227405A2] The invention concerns an illumination system, particularly for microlithography with wavelengths </= 193 nm, comprising: a primary light source; a first optical component; a second optical component; an image plane; and an exit pupil, wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil, wherein said first optical component includes a first optical element having a plurality of first raster elements that are imaged into said image plane, producing a plurality of images being superimposed, at least partially, on a field in said image plane, wherein said first optical component comprises a collector unit and a second optical element having a plurality of second raster elements, said illumination system further comprising: a first optical axis between said collector unit and said first optical element, wherein said first optical element is reflective; a second optical axis between said first optical element and said second optical element, wherein said second optical element is reflective; and a third optical axis between said second optical element and said second optical component, wherein the directional vector of the first optical axis and the directional vector of the second optical axis define a plane and wherein said first and second optical elements are tilted to cause a crossing of the projection of said third optical axis in to said plane and said first optical axis.
IPC 1-7
IPC 8 full level
G02B 19/00 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01); G21K 5/04 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP)
B82Y 10/00 (2013.01); G03F 7/70083 (2013.01); G03F 7/70108 (2013.01); G03F 7/70166 (2013.01); G03F 7/702 (2013.01); G03F 7/70233 (2013.01); G03F 7/70358 (2013.01); G03F 7/70891 (2013.01); G21K 1/06 (2013.01)
Citation (search report)
See references of WO 0227405A2
Designated contracting state (EPC)
AT BE DE NL
DOCDB simple family (publication)
WO 0227405 A2 20020404; WO 0227405 A3 20020718; EP 1320857 A2 20030625; JP 2004510344 A 20040402
DOCDB simple family (application)
EP 0111224 W 20010928; EP 01985764 A 20010928; JP 2002530922 A 20010928