Global Patent Index - EP 1325163 A4

EP 1325163 A4 20050216 - DUAL-PURPOSE INSTALLATION FOR CONTINUOUS ANNEALING AND HOT DIP PLATING

Title (en)

DUAL-PURPOSE INSTALLATION FOR CONTINUOUS ANNEALING AND HOT DIP PLATING

Title (de)

DOPPELFUNKTIONSANLAGE FÜR KONTINUIERLICHE GLÜHBEHANDLUNG UND SCHMELZTAUCHBESCHICHTUNG

Title (fr)

INSTALLATION A DOUBLE USAGE POUR LE RECUIT CONTINU ET LA GALVANISATION A CHAUD

Publication

EP 1325163 A4 20050216 (EN)

Application

EP 01965631 A 20010913

Priority

  • JP 0107969 W 20010913
  • JP 2000278566 A 20000913

Abstract (en)

[origin: US2003189276A1] The present invention provides a dual-purpose installation for continuous annealing and hot dip plating to produce a continuously annealed steel sheet and a hot dip plated steel sheet by switching process routes in the single installation, and according to the present invention, by installing a bypass facility which leads a steel sheet from a continuous annealing furnace to a water quenching facility without it traveling through a plating pot and a plating facility in the a dual-purpose installation for continuous annealing and hot dip plating, it becomes possible to prevent the steel sheet coming out from the annealing furnace from being exposed to the outside atmosphere and being oxidized during the production of a continuously annealed product and to realize a less expensive dual-purpose installation for continuous annealing and hot dip plating.

IPC 1-7

C21D 9/56; C23C 2/02

IPC 8 full level

C21D 9/56 (2006.01); C23C 2/00 (2006.01); C23C 2/40 (2006.01); C21D 9/573 (2006.01)

CPC (source: EP KR US)

C21D 9/56 (2013.01 - EP KR US); C21D 9/561 (2013.01 - EP US); C21D 9/562 (2013.01 - EP US); C23C 2/00 (2013.01 - EP KR US); C23C 2/40 (2013.01 - EP US); C21D 9/573 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

DE FR GB IT NL

DOCDB simple family (publication)

US 2003189276 A1 20031009; AU 2001286234 B2 20050616; AU 8623401 A 20020326; BR 0113848 A 20030603; BR 0113848 B1 20110712; CA 2421925 A1 20020321; CN 100357461 C 20071226; CN 1452667 A 20031029; DE 60133912 D1 20080619; EP 1325163 A1 20030709; EP 1325163 A4 20050216; EP 1325163 B1 20080507; JP 2002088414 A 20020327; KR 20030027107 A 20030403; RU 2255138 C2 20050627; TW 565620 B 20031211; WO 0222894 A1 20020321

DOCDB simple family (application)

US 38060903 A 20030312; AU 2001286234 A 20010913; AU 8623401 A 20010913; BR 0113848 A 20010913; CA 2421925 A 20010913; CN 01815331 A 20010913; DE 60133912 T 20010913; EP 01965631 A 20010913; JP 0107969 W 20010913; JP 2000278566 A 20000913; KR 20037003140 A 20030228; RU 2003106806 A 20010913; TW 90122602 A 20010912