EP 1326903 A2 20030716 - COMPOSITIONS FOR MICROLITHOGRAPHY
Title (en)
COMPOSITIONS FOR MICROLITHOGRAPHY
Title (de)
ZUSAMMENSETZUNGEN FÜR DIE MIKROLITHOGRAPHIE
Title (fr)
COMPOSITIONS POUR MICROLITHOGRAPHIE
Publication
Application
Priority
- US 0142743 W 20011016
- US 69128000 A 20001018
Abstract (en)
[origin: WO0233489A2] A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: -C(Rf)(Rf')Orb wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm-<1> at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
IPC 1-7
IPC 8 full level
C08F 232/00 (2006.01); C08F 232/08 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR)
C08F 232/08 (2013.01 - EP); G03F 7/0045 (2013.01 - EP); G03F 7/0046 (2013.01 - EP); G03F 7/039 (2013.01 - KR); G03F 7/0395 (2013.01 - EP)
Citation (search report)
See references of WO 0233489A2
Designated contracting state (EPC)
AT BE CH CY DE DK FR GB IE IT LI NL
DOCDB simple family (publication)
WO 0233489 A2 20020425; WO 0233489 A3 20021121; AU 3238302 A 20020429; CN 1214054 C 20050810; CN 1484659 A 20040324; EP 1326903 A2 20030716; JP 2004512396 A 20040422; KR 20040004403 A 20040113; TW 569079 B 20040101
DOCDB simple family (application)
US 0142743 W 20011016; AU 3238302 A 20011016; CN 01817583 A 20011016; EP 01987900 A 20011016; JP 2002536611 A 20011016; KR 20037005196 A 20030412; TW 90125691 A 20011017