EP 1327172 A1 20030716 - 8-MIRRORED MICROLITHOGRAPHIC PROJECTOR LENS
Title (en)
8-MIRRORED MICROLITHOGRAPHIC PROJECTOR LENS
Title (de)
8-SPIEGEL-MIKROLITHOGRAPHIE-PROJEKTIONSOBJEKTIV
Title (fr)
OBJECTIF DE PROJECTION PAR MICROLITHOGRAPHIE A 8 MIROIRS
Publication
Application
Priority
- DE 10052289 A 20001020
- EP 0112110 W 20011019
- US 25521600 P 20001213
Abstract (en)
[origin: WO0233467A1] The invention relates to a microlithographic projector lens for EUV-lithography with a wavelength in the range 10 - 30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the transformation of an object field in an object plane into an image field in an image plane. The invention is characterised in that the microlithographic projector lens comprises a first, second, third, fourth, fifth, sixth, seventh and eighth mirror (51-58) and the beam path from the object plane (100) to the image plane (102) is free from obscuration.
IPC 1-7
IPC 8 full level
G02B 17/00 (2006.01); G02B 17/06 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G02B 3/00 (2013.01 - KR); G02B 17/0657 (2013.01 - EP US); G03F 7/70233 (2013.01 - EP US); G03F 7/70275 (2013.01 - EP US)
Citation (search report)
See references of WO 0233467A1
Designated contracting state (EPC)
DE FR GB NL
DOCDB simple family (publication)
WO 0233467 A1 20020425; EP 1327172 A1 20030716; JP 2004512552 A 20040422; KR 20030045817 A 20030611; US 2004012866 A1 20040122; US 2007047069 A1 20070301; US 2008137183 A1 20080612; US 7177076 B2 20070213; US 7372624 B2 20080513; US 7508580 B2 20090324
DOCDB simple family (application)
EP 0112110 W 20011019; EP 01982439 A 20011019; JP 2002536594 A 20011019; KR 20037004654 A 20030401; US 1282508 A 20080206; US 41851503 A 20030418; US 59206506 A 20061102