EP 1332406 A2 20030806 - PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY
Title (en)
PHOTOACID GENERATORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY
Title (de)
FOTOSÄURE ERZEUGENDE SUBSTANZEN IN PHOTORESISTZUSAMMENSETZUNGEN FÜR DIE MIKROLITHOGRAPHIE
Title (fr)
GENERATEURS PHOTOACIDES UTILISES DANS DES COMPOSITIONS DE PHOTORESIST POUR LA MICROLITHOGRAPHIE
Publication
Application
Priority
- US 0148006 W 20011031
- US 24739300 P 20001109
Abstract (en)
[origin: WO0239186A2] A photoresist composition having a polymeric binder; and a photoactive component selected from the group consisting of (1) hydroxamic acid sulfonoxy esters containing a perfluoroalkyl group containing at least five carbon atoms; (2) S-perfluoroalkyldibenzothiophenium salts; and (3) S-perfluoroalkyldiarylsulfonium salts. These photoactive components are compatible with the polymeric binders that are useful for imaging with exposure to light at the relatively shorter wavelengths, such as 157 nm.
IPC 1-7
IPC 8 full level
G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01); G03F 7/038 (2006.01)
CPC (source: EP KR)
G03F 7/004 (2013.01 - KR); G03F 7/0045 (2013.01 - EP); G03F 7/0046 (2013.01 - EP); G03F 7/0395 (2013.01 - EP); G03F 7/0382 (2013.01 - EP)
Citation (search report)
See references of WO 0239186A2
Designated contracting state (EPC)
AT BE CH CY DE DK FR GB IE IT LI NL
DOCDB simple family (publication)
WO 0239186 A2 20020516; WO 0239186 A3 20021121; AU 2901002 A 20020521; CN 1575438 A 20050202; EP 1332406 A2 20030806; JP 2004537740 A 20041216; KR 20040004429 A 20040113; TW 581935 B 20040401
DOCDB simple family (application)
US 0148006 W 20011031; AU 2901002 A 20011031; CN 01818641 A 20011031; EP 01990140 A 20011031; JP 2002541449 A 20011031; KR 20037006106 A 20030502; TW 90127881 A 20011109