EP 1361933 A1 20031119 - POLISHING APPARATUS AND DRESSING METHOD
Title (en)
POLISHING APPARATUS AND DRESSING METHOD
Title (de)
POLIERVORRICHTUNG UND ABRICHTVERFAHREN
Title (fr)
APPAREIL DE POLISSAGE ET PROCEDE DE DECRASSAGE
Publication
Application
Priority
- JP 0201456 W 20020220
- JP 2001043777 A 20010220
Abstract (en)
[origin: WO02066207A1] The apparatus for polishing a substrate while pressing the substrate into sliding contact with the fixed abrasive, comprises: a light source (32) for dressing the fixed abrasive by light irradiation; and a device (41) for supplying a chemical agent or a chemical liquid for promoting the self-generation of abrasive particles in the dressing by light irradiation. The supply of a chemical agent or a chemical liquid onto the surface of fixed abrasive can promote or maintain dressing effect attained by the light irradiation. The chemical agent or the chemical liquid to be supplied preferably contains boron, particularly preferably a borate.
IPC 1-7
IPC 8 full level
B24B 53/00 (2006.01); B24B 53/007 (2006.01); B24B 53/017 (2012.01)
CPC (source: EP KR US)
B24B 37/04 (2013.01 - KR); B24B 37/24 (2013.01 - KR); B24B 53/001 (2013.01 - EP US); B24B 53/017 (2013.01 - EP KR US); B24B 53/02 (2013.01 - KR)
Citation (search report)
See references of WO 02066207A1
Designated contracting state (EPC)
DE FR
DOCDB simple family (publication)
WO 02066207 A1 20020829; EP 1361933 A1 20031119; KR 20030022105 A 20030315; US 2003100246 A1 20030529
DOCDB simple family (application)
JP 0201456 W 20020220; EP 02700615 A 20020220; KR 20027012822 A 20020927; US 22177102 A 20020917