Global Patent Index - EP 1366125 A2

EP 1366125 A2 20031203 - PHOTODEGRADATION-RESISTANT ELECTRODEPOSITABLE COATING COMPOSITIONS AND PROCESSES RELATED THERETO

Title (en)

PHOTODEGRADATION-RESISTANT ELECTRODEPOSITABLE COATING COMPOSITIONS AND PROCESSES RELATED THERETO

Title (de)

PHOTODEGRADIERUNGUNGSBESTÄNDIGE ELEKTROTAUCH-ÜBERZUGSZUSAMMENSETZUNGEN SOWIE VERFAHREN DIE SICH DARAUF BEZIEHEN

Title (fr)

COMPOSITIONS DE REVETEMENT APPLICABLE PAR ELECTRODEPOSITION RESISTANT A LA PHOTODEGRADATION ET LEURS PROCEDES DE FORMATION

Publication

EP 1366125 A2 20031203 (EN)

Application

EP 02706133 A 20020204

Priority

  • US 0203209 W 20020204
  • US 26657601 P 20010205
  • US 26657701 P 20010205
  • US 583001 A 20011108

Abstract (en)

[origin: WO02070613A2] The invention provides a process for coating a substrate including electrodepositing an electrodepositable composition on the substrate, heating the coated substrate to cure the coating thereon, applying over the cured electrodeposited coating one or more pigment-containing coating compositions and/or one or more pigment-free coating compositions to form a top coat thereover, and heating the coated substrate to cure the top coat. The elecrodepositable composition is formed from an ungelled cationic salt group-containing resin where the salt groups are formed from pendant and/or terminal amino groups, and an at least partially blocked aliphatic polyisocyanate curing agent. Also provided is a photodegradation resistant multi-layer composite coating of a primer layer formed from the electrodepositable composition and a top coat thereover, where the composite coating exhibits substantially no interlayer delamination upon concentrated solar spectral irradiance exposure equivalent to two years outdoor weathering. The invention further provides improved processes for electrophoretically coating a substrate.

IPC 1-7

C09D 5/44; C25D 13/06; B05D 7/00

IPC 8 full level

C09D 163/00 (2006.01); B05D 7/00 (2006.01); C09D 5/44 (2006.01); C09D 175/04 (2006.01); C25D 13/00 (2006.01); C25D 13/06 (2006.01); B05D 1/00 (2006.01)

CPC (source: EP KR US)

B05D 1/00 (2013.01 - KR); B05D 3/0254 (2013.01 - KR); B05D 7/52 (2013.01 - EP US); B05D 7/546 (2013.01 - EP US); B05D 7/56 (2013.01 - EP US); C08K 5/05 (2013.01 - KR); C08K 5/053 (2013.01 - KR); C08K 5/17 (2013.01 - KR); C08K 5/3412 (2013.01 - KR); C08L 75/00 (2013.01 - KR); C09D 5/4434 (2013.01 - EP US); C09D 5/4473 (2013.01 - EP US); C09D 5/4488 (2013.01 - EP US); C09D 7/63 (2017.12 - KR); C09D 7/65 (2017.12 - KR); C09D 133/04 (2013.01 - KR); C09D 163/00 (2013.01 - KR); C09D 167/00 (2013.01 - KR); C09D 175/04 (2013.01 - KR); B05D 1/007 (2013.01 - EP US); Y10T 428/12569 (2015.01 - EP US)

Citation (search report)

See references of WO 02070613A2

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 02070613 A2 20020912; WO 02070613 A3 20030327; BR 0204175 A 20040615; CA 2404930 A1 20020912; CN 1551907 A 20041201; EP 1366125 A2 20031203; JP 2004519542 A 20040702; KR 100510042 B1 20050825; KR 20020093889 A 20021216; US 2003054193 A1 20030320

DOCDB simple family (application)

US 0203209 W 20020204; BR 0204175 A 20020204; CA 2404930 A 20020204; CN 02800485 A 20020204; EP 02706133 A 20020204; JP 2002570642 A 20020204; KR 20027013348 A 20021004; US 583001 A 20011108