EP 1368506 A1 20031210 - METHOD FOR THE PRODUCTION OF A FUNCTIONAL COATING BY MEANS OF A HIGH-FREQUENCY ICP PLASMA BEAM SOURCE
Title (en)
METHOD FOR THE PRODUCTION OF A FUNCTIONAL COATING BY MEANS OF A HIGH-FREQUENCY ICP PLASMA BEAM SOURCE
Title (de)
VERFAHREN ZUR ERZEUGUNG EINER FUNKTIONSBESCHICHTUNG MIT EINER HF-ICP-PLASMASTRAHLQUELLE
Title (fr)
PROCEDE DE GENERATION D'UN REVETEMENT FONCTIONNEL A L'AIDE D'UNE SOURCE DE PLASMA INDUCTIF HAUTE FREQUENCE
Publication
Application
Priority
- DE 0104357 W 20011121
- DE 10104615 A 20010202
Abstract (en)
[origin: DE10104615A1] A method for the production of a functional coating on a substrate (19), arranged in a chamber (40), is disclosed, whereby a plasma (21) is generated by means of an inductively-coupled, high-frequency plasma beam source (5) with a burner body (25) with an outlet opening (26), defining a plasma generation chamber (27). Said plasma (21) passes through the outlet opening in the form of a plasma beam (20) from the plasma beam source (5) into the chamber (40) connected thereto, where the above impinges on the substrate (19) to produce the functional coating. Furthermore, a pressure gradient is at least intermittently generated between the interior of the chamber (40) and the plasma generation chamber, which generates an acceleration of the particles contained in the plasma beam (20) onto the substrate (19).
IPC 1-7
IPC 8 full level
H05H 1/42 (2006.01); B01J 19/08 (2006.01); C23C 16/505 (2006.01); C23C 16/513 (2006.01); C23C 16/515 (2006.01); C23C 16/52 (2006.01); H05H 1/46 (2006.01)
CPC (source: EP US)
C23C 16/513 (2013.01 - EP US); C23C 16/515 (2013.01 - EP US); C23C 16/52 (2013.01 - EP US); H01J 37/321 (2013.01 - EP US)
Citation (search report)
See references of WO 02061171A1
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
DOCDB simple family (publication)
DE 10104615 A1 20020814; EP 1368506 A1 20031210; JP 2004518027 A 20040617; US 2004115364 A1 20040617; WO 02061171 A1 20020808
DOCDB simple family (application)
DE 10104615 A 20010202; DE 0104357 W 20011121; EP 01273584 A 20011121; JP 2002561102 A 20011121; US 47092604 A 20040120