Global Patent Index - EP 1373331 A4

EP 1373331 A4 20070117 - THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION

Title (en)

THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION

Title (de)

THERMISCH GEHÄRTETE UNTERSCHICHT FÜR DIE LITHOGRAPHIE

Title (fr)

SOUS-COUCHE DURCIE THERMIQUEMENT POUR APPLICATION LITHOGRAPHIQUE

Publication

EP 1373331 A4 20070117 (EN)

Application

EP 02733834 A 20020307

Priority

  • US 0207136 W 20020307
  • US 27552801 P 20010313

Abstract (en)

[origin: WO02073307A2] Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the formula (I) wherein R<1> is H or methyl; R<2> is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, Cl-4 alkyl or C1-4 alkoxy; R<3> is a hydroxyl functionalized Cl-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R<4> is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [-R<4>O-]p ; R<5> is a Cl-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-Cl4 aryl, or substituted or unsubstituted C7-Cl5 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.

IPC 8 full level

G03F 7/09 (2006.01); G03F 7/11 (2006.01); C08F 220/10 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR)

C08F 212/32 (2013.01 - KR); G03F 7/091 (2013.01 - EP); G03F 7/094 (2013.01 - EP)

Citation (search report)

Citation (examination)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 02073307 A2 20020919; WO 02073307 A3 20021121; EP 1373331 A2 20040102; EP 1373331 A4 20070117; JP 2004534107 A 20041111; KR 100709330 B1 20070420; KR 20040024853 A 20040322; TW 574234 B 20040201

DOCDB simple family (application)

US 0207136 W 20020307; EP 02733834 A 20020307; JP 2002572501 A 20020307; KR 20037011930 A 20030909; TW 91104609 A 20020312