EP 1377879 A2 20040107 - PHOTORESIST COMPOSITIONS COMPRISING SOLVENTS FOR SHORT WAVELENGTH IMAGING
Title (en)
PHOTORESIST COMPOSITIONS COMPRISING SOLVENTS FOR SHORT WAVELENGTH IMAGING
Title (de)
LÖSUNGSMITTEL ENTHALTENDE PHOTORESISTZUSAMMENSETZUNGEN FÜR KURZWELLENLÄNGIGE BILDERZEUGUNG
Title (fr)
SOLVANTS ET COMPOSITIONS DE PHOTORESINE POUR L'IMAGERIE A ONDES COURTES
Publication
Application
Priority
- US 0208127 W 20020315
- US 27817001 P 20010322
Abstract (en)
[origin: WO02084401A2] New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as nm. Resists of the invention comprise a fluorinecontaining polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.
IPC 1-7
IPC 8 full level
G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR)
G03F 7/0046 (2013.01 - EP); G03F 7/0048 (2013.01 - EP); G03F 7/038 (2013.01 - KR); G03F 7/0392 (2013.01 - EP); G03F 7/0395 (2013.01 - EP); G03F 7/0397 (2013.01 - EP)
Citation (search report)
See references of WO 02084401A2
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
DOCDB simple family (publication)
WO 02084401 A2 20021024; WO 02084401 A3 20030515; WO 02084401 A9 20040219; AU 2002257066 A1 20021028; CN 100378578 C 20080402; CN 1505773 A 20040616; EP 1377879 A2 20040107; JP 2005509180 A 20050407; KR 20040062877 A 20040709; TW I308256 B 20090401
DOCDB simple family (application)
US 0208127 W 20020315; AU 2002257066 A 20020315; CN 02808944 A 20020315; EP 02726647 A 20020315; JP 2002582085 A 20020315; KR 20037012363 A 20030922; TW 91105402 A 20020321