EP 1385190 A1 20040128 - Oxide cathode for electron gun with a differentially doped metallic substrate
Title (en)
Oxide cathode for electron gun with a differentially doped metallic substrate
Title (de)
Oxidkathode für eine Elektronenkanone mit einem unterschiedlich dotierten metallischen Substrat
Title (fr)
Cathode à oxyde pour canon à électrons avec un substrat métallique présentant un dopage différentiel
Publication
Application
Priority
EP 02291859 A 20020724
Abstract (en)
The metallic substrate of this cathode has a thickness ≤ 100 mu m and contains a plurality of reducing agents as Si or Al and : on the top face 111, 0.005 % < Mg ≤ 0.02 %, Si or Al ≤ 0.025 %, and W ≤ 0.008 %, on the bottom face 122, Mg weight concentration is inferior to the Mg weight concentration on the top face, and Si or Al weight concentration is superior to Si or Al weight concentration on the top face and superior to 0.02 %. <??>Lifetime is maximized and turn-on-time is minimized. <IMAGE>
IPC 1-7
IPC 8 full level
H01J 1/14 (2006.01); H01J 1/20 (2006.01); H01J 1/26 (2006.01); H01J 29/48 (2006.01)
CPC (source: EP)
H01J 1/26 (2013.01)
Citation (search report)
- [A] US 3911312 A 19751007 - COENEN RENIER GERTRUDA HUBERTU, et al
- [A] US 3535757 A 19701027 - NESTLEROTH PAUL L, et al
- [A] EP 1152447 A1 20011107 - THOMSON LICENSING SA [FR]
- [A] US 4215180 A 19800729 - MISUMI AKIRA [JP], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR
DOCDB simple family (publication)
EP 1385190 A1 20040128; AU 2003262530 A1 20040216; CN 100437874 C 20081126; CN 1669104 A 20050914; DE 60305931 D1 20060720; DE 60305931 T2 20070621; JP 2005534153 A 20051110; MX PA05001022 A 20050516; PL 374774 A1 20051031; WO 2004012217 A1 20040205
DOCDB simple family (application)
EP 02291859 A 20020724; AU 2003262530 A 20030721; CN 03817215 A 20030721; DE 60305931 T 20030721; EP 0350323 W 20030721; JP 2004523813 A 20030721; MX PA05001022 A 20030721; PL 37477403 A 20030721