EP 1390813 A2 20040225 - MICROLITHOGRAPIC PROJECTION ILLUMINATION SYSTEM, OPTICAL SYSTEM, METHOD FOR THE PRODUCTION OF A MICROLITHOGRAPHIC PROJECTION LENS SYSTEM AND MICROLITHOGRAPHIC STRUCTURING METHOD
Title (en)
MICROLITHOGRAPIC PROJECTION ILLUMINATION SYSTEM, OPTICAL SYSTEM, METHOD FOR THE PRODUCTION OF A MICROLITHOGRAPHIC PROJECTION LENS SYSTEM AND MICROLITHOGRAPHIC STRUCTURING METHOD
Title (de)
PROJEKTIONSBELICHTUNGSANLAGE DER MIKROLITHOGRAPHIE
Title (fr)
DISPOSITIF D'INSOLATION PAR PROJECTION POUR MICROLITHOGRAPHIE, SYSTEME OPTIQUE, PROCEDE DE FABRICATION D'UN OBJECTIF DE PROJECTION POUR MICROLITHOGRAPHIE ET PROCEDE DE STRUCTURATION MICROLITHOGRAPHIQUE
Publication
Application
Priority
- DE 10123725 A 20010515
- EP 0204900 W 20020504
Abstract (en)
[origin: US2004150806A1] A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
IPC 1-7
IPC 8 full level
G02B 1/02 (2006.01); G02B 5/30 (2006.01); G02B 7/02 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G02B 1/02 (2013.01 - EP US); G02B 1/08 (2013.01 - EP US); G02B 5/3083 (2013.01 - EP US); G03B 21/00 (2013.01 - KR); G03F 7/70241 (2013.01 - EP US); G03F 7/70825 (2013.01 - EP US); G03F 7/70966 (2013.01 - EP US)
Citation (search report)
See references of WO 02093257A2
Designated contracting state (EPC)
DE NL
DOCDB simple family (publication)
US 2004150806 A1 20040805; US 6879379 B2 20050412; DE 10123725 A1 20021121; EP 1390813 A2 20040225; JP 2004525527 A 20040819; KR 20030019577 A 20030306; TW I266149 B 20061111; US 2005134967 A1 20050623; US 2005264786 A1 20051201; US 7170585 B2 20070130; WO 02093257 A2 20021121; WO 02093257 A3 20030925; WO 02093257 A8 20031231
DOCDB simple family (application)
US 71457303 A 20031114; DE 10123725 A 20010515; EP 0204900 W 20020504; EP 02769464 A 20020504; JP 2002589877 A 20020504; KR 20037000622 A 20030115; TW 91108888 A 20020429; US 10123505 A 20050407; US 90673705 A 20050303