Global Patent Index - EP 1396870 A3

EP 1396870 A3 20040721 - Sputter ion source

Title (en)

Sputter ion source

Title (de)

Sputterionenquelle

Title (fr)

Source d'ions à pulvérisation cathodique

Publication

EP 1396870 A3 20040721 (DE)

Application

EP 03017996 A 20030807

Priority

DE 10241252 A 20020906

Abstract (en)

[origin: EP1396870A2] A source for sputter ions includes an ionizer (2), a cathode (3), a sputter insert (4), an activation electrode (5), a shielding cap (6) and a cathode insulator (7) in a vacuum-sealed casing. A shielding electrode (1) fits with a hollow cylindrical shape around a sputter cathode consisting of the cathode, the sputter insert and the shielding cap.

IPC 1-7

H01J 27/20; H01J 27/22

IPC 8 full level

H01J 27/04 (2006.01)

CPC (source: EP US)

H01J 27/04 (2013.01 - EP US)

Citation (search report)

  • [X] LIU LIANFAN ET AL: "THE AMS SYSTEM AT THE SHANGHAI INSTITUTE OF NUCLEAR RESEARCH", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B52, no. 3 / 4, 2 December 1990 (1990-12-02), pages 298 - 300, XP000178381, ISSN: 0168-583X
  • [Y] R. MIDDLETON: "A versatile high intensity negative ion source", NUCLEAR INSTRUMENTS AND METHODS, vol. 214, 1 September 1983 (1983-09-01), pages 139 - 150, XP009031202
  • [Y] MOUS D J W ET AL: "THE HVEE TANDETRON LINE;NEW DEVELOPMENTS AND DESIGN CONSIDERATIONS", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B62, no. 3, 2 January 1992 (1992-01-02), pages 421 - 424, XP000248270, ISSN: 0168-583X
  • [A] ALTON G D: "ION SOURCES FOR ACCELERATORS IN MATERIALS RESEARCH", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B73, no. 2, 1 February 1993 (1993-02-01), pages 221 - 288, XP000381499, ISSN: 0168-583X

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

DOCDB simple family (publication)

EP 1396870 A2 20040310; EP 1396870 A3 20040721; EP 1396870 B1 20060426; AT E324667 T1 20060515; DE 10241252 A1 20040325; DE 10241252 B4 20040902; DE 50303089 D1 20060601; US 2004182699 A1 20040923; US 6929725 B2 20050816

DOCDB simple family (application)

EP 03017996 A 20030807; AT 03017996 T 20030807; DE 10241252 A 20020906; DE 50303089 T 20030807; US 65589603 A 20030904