Global Patent Index - EP 1404726 A2

EP 1404726 A2 20040407 - LOW-MOLECULAR AND HIGH-MOLECULAR EMULSIFIERS, PARTICULARLY BASED ON POLYISOBUTYLENE, AND MIXTURES THEREOF

Title (en)

LOW-MOLECULAR AND HIGH-MOLECULAR EMULSIFIERS, PARTICULARLY BASED ON POLYISOBUTYLENE, AND MIXTURES THEREOF

Title (de)

NIEDER- UND HOCHMOLEKULARE EMULGATOREN, INSBESONDERE AUF BASIS VON POLYISOBUTYLEN, SOWIE DEREN MISCHUNGEN

Title (fr)

EMULSIFIANTS DE MASSES MOLECULAIRES FAIBLES ET ELEVEES A BASE DE POLYISOBUTYLENE, ET MELANGES DE CES EMULSIFIANTS

Publication

EP 1404726 A2 20040407 (DE)

Application

EP 02750949 A 20020517

Priority

  • DE 10125158 A 20010522
  • EP 0205516 W 20020517

Abstract (en)

[origin: WO02094889A2] The invention relates to low-molecular and high-molecular diblock emulsifiers, particularly based on polyisobutylene, of general formulas (Ia) and (Ib), and to mixtures thereof, whereby: L<a> represents a polyisobutylene group having a numerical average molecular weight Mn ranging from 300 to 1000; L<b> represents a polyisobutylene group having a numerical average molecular weight Mn ranging from 2000 to 20000; -A- represents -O-, -N(H)- or N(R<1>)-; M<+> represents H<+>, an alkali metal ion, 0.5 alkaline-earth metal ions or NH4<+>, whereby in NH4<+>, one or more H's can be substituted by alkyl radicals; R represents a linear or branched saturated hydrocarbon radical, which supports at least one substituent selected from the group consisting of OH, NH2 or NH3<+> and optionally supports one or more C(O)H groups while optionally containing one or more non-adjacent -O- and/or secondary amines and/or tertiary amines and, in the NH2 or NH3<+> groups, one or more H's can be substituted by alkyl radicals, and; R<1> represents a linear or branched saturated hydrocarbon radical, which optionally supports one or more substituents selected from the group consisting of OH, NH2, NH3<+> or C(O)H while optionally containing one or more non-adjacent -O- and/or secondary amines and/or tertiary amines and, in the NH2 or NH3<+> groups, one or more H's can be substituted by alkyl radicals, and the proportion of A-R on the compound of general formula (Ib) equals at least 20 wt. %.

IPC 1-7

C08F 8/14; C08F 8/32; B01F 17/00; C10L 1/18; C10L 1/22; C10L 1/32; C10M 133/54; C10M 133/56; C10M 129/95; C10M 145/38; C11D 1/04

IPC 8 full level

C07C 69/602 (2006.01); C07C 233/20 (2006.01); C08F 8/14 (2006.01); C08F 8/46 (2006.01); C08F 110/10 (2006.01); C08G 65/28 (2006.01); C09K 23/00 (2022.01); C09K 23/52 (2022.01); C10L 1/10 (2006.01); C10L 1/198 (2006.01); C10L 1/238 (2006.01); C10L 1/2383 (2006.01); C10L 1/2387 (2006.01); C10L 1/32 (2006.01); C10L 10/00 (2006.01); C10L 10/02 (2006.01); C10L 10/04 (2006.01); C10M 129/76 (2006.01); C10M 129/95 (2006.01); C10M 133/16 (2006.01); C10M 133/56 (2006.01); C10M 141/02 (2006.01); C10M 141/06 (2006.01); C10M 173/00 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C10L 1/12 (2006.01); C10L 1/18 (2006.01); C10L 1/22 (2006.01)

CPC (source: EP US)

C08F 8/14 (2013.01 - EP US); C08F 110/10 (2013.01 - EP US); C09K 23/017 (2022.01 - EP US); C09K 23/018 (2022.01 - EP US); C09K 23/16 (2022.01 - EP US); C10L 1/10 (2013.01 - EP US); C10L 1/198 (2013.01 - EP US); C10L 1/1985 (2013.01 - EP US); C10L 1/238 (2013.01 - EP US); C10L 1/2383 (2013.01 - EP US); C10L 1/2387 (2013.01 - EP US); C10L 1/328 (2013.01 - EP US); C10L 10/02 (2013.01 - EP US); C10L 10/04 (2013.01 - EP US); C10L 10/08 (2013.01 - EP US); C10M 129/76 (2013.01 - EP US); C10M 129/95 (2013.01 - EP US); C10M 133/16 (2013.01 - EP US); C10M 133/56 (2013.01 - EP US); C10M 141/02 (2013.01 - EP US); C10M 141/06 (2013.01 - EP US); C10M 173/00 (2013.01 - EP US); C11D 1/008 (2013.01 - EP US); C11D 3/3715 (2013.01 - EP US); C11D 3/3757 (2013.01 - EP US); C08F 2810/20 (2013.01 - EP US); C09K 23/42 (2022.01 - EP US); C10L 1/125 (2013.01 - EP US); C10L 1/1266 (2013.01 - EP US); C10L 1/1824 (2013.01 - EP US); C10L 1/1826 (2013.01 - EP US); C10L 1/1852 (2013.01 - EP US); C10L 1/1857 (2013.01 - EP US); C10L 1/191 (2013.01 - EP US); C10L 1/2222 (2013.01 - EP US); C10M 2207/288 (2013.01 - EP US); C10M 2215/12 (2013.01 - EP US); C10M 2215/28 (2013.01 - EP US); C10N 2010/02 (2013.01 - EP US); C10N 2010/04 (2013.01 - EP US); C10N 2020/04 (2013.01 - EP US); C10N 2030/04 (2013.01 - EP US); C10N 2030/06 (2013.01 - EP US); C10N 2030/12 (2013.01 - EP US); C10N 2050/013 (2020.05 - EP US)

C-Set (source: EP US)

C08F 110/10 + C08F 2500/02 + C08F 2500/03

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 02094889 A2 20021128; WO 02094889 A3 20031127; AU 2002338977 A1 20021203; CA 2448033 A1 20021128; CN 1511167 A 20040707; DE 10125158 A1 20021205; EP 1404726 A2 20040407; JP 2004531614 A 20041014; US 2004154216 A1 20040812

DOCDB simple family (application)

EP 0205516 W 20020517; AU 2002338977 A 20020517; CA 2448033 A 20020517; CN 02810580 A 20020517; DE 10125158 A 20010522; EP 02750949 A 20020517; JP 2002592363 A 20020517; US 47847603 A 20031121