EP 1417541 A2 20040512 - Illumination system
Title (en)
Illumination system
Title (de)
Beleuchtungssystem
Title (fr)
Système d'illumination
Publication
Application
Priority
- DE 10138847 A 20010815
- EP 0208180 W 20020723
Abstract (en)
[origin: WO03017003A2] The invention relates to a diaphragm (1) for an integrator unit of a micro-lithography projection exposure system. Said diaphragm (1) comprises a diaphragm opening (3), which is symmetrical in relation to a first axis of symmetry (5). The widths of the diaphragm aperture (3) in the direction of the axis of symmetry (5) are dependent on the distance of y from the first axis of symmetry (5), said widths being greater than or equal to the width when y=0. The diaphragm (1), together with a cylindrical integrator, forms an integrator unit, which is located in an illumination system.
IPC 1-7
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP US)
G03F 7/70075 (2013.01 - EP US); G03F 7/70091 (2013.01 - EP US)
Citation (search report)
See references of WO 03017003A2
Designated contracting state (EPC)
DE NL
DOCDB simple family (publication)
WO 03017003 A2 20030227; WO 03017003 A3 20040122; DE 10138847 A1 20030227; EP 1417541 A2 20040512; TW 565738 B 20031211; US 2004160591 A1 20040819; US 6885434 B2 20050426
DOCDB simple family (application)
EP 0208180 W 20020723; DE 10138847 A 20010815; EP 02754928 A 20020723; TW 91116304 A 20020722; US 77710904 A 20040213