Global Patent Index - EP 1456296 A1

EP 1456296 A1 20040915 - ADDITIVE FOR INHIBITING PHOTOLYTIC DEGRADATION REACTIONS IN AMINOPLASTS

Title (en)

ADDITIVE FOR INHIBITING PHOTOLYTIC DEGRADATION REACTIONS IN AMINOPLASTS

Title (de)

ADDITIV ZUR INHIBIERUNG VON PHOTOLYTISCHEN ABBAUREAKTIONEN IN AMINOPLASTEN

Title (fr)

ADDITIF PERMETTANT D'INHIBER DES REACTIONS DE DEGRADATION PHOTOLYTIQUES DANS DES AMINOPLATES

Publication

EP 1456296 A1 20040915 (DE)

Application

EP 02799749 A 20021219

Priority

  • AT 20102001 A 20011220
  • DE 10233848 A 20020722
  • EP 0214644 W 20021219

Abstract (en)

[origin: WO03054083A1] The invention relates to a UV additive for aminoplast resins, to a method for producing a UV additive as well as to uses thereof. Said UV additive is characterised in that it contains soluble sterically-hindered nitroxyl compounds in an aqueous aminoplast precondensate. A UV additive for aminoplast resins with several application forms is thus obtained.

IPC 1-7

C08L 61/20; C08J 5/24; C08K 5/3435

IPC 8 full level

C08K 5/3435 (2006.01); C08L 61/20 (2006.01)

CPC (source: EP US)

C08K 5/3435 (2013.01 - EP US); C08L 61/20 (2013.01 - EP US); Y10T 428/31504 (2015.04 - EP US); Y10T 428/31971 (2015.04 - EP US)

Citation (search report)

See references of WO 03054083A1

Citation (examination)

EP 0314620 A1 19890503 - CIBA GEIGY AG [CH]

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SI SK TR

DOCDB simple family (publication)

WO 03054083 A1 20030703; AR 037960 A1 20041222; AU 2002364397 A1 20030709; AU 2002364397 B2 20070712; EP 1456296 A1 20040915; TW 200302850 A 20030816; US 2005234160 A1 20051020; US 7368489 B2 20080506

DOCDB simple family (application)

EP 0214644 W 20021219; AR P020105049 A 20021219; AU 2002364397 A 20021219; EP 02799749 A 20021219; TW 91136886 A 20021220; US 49950405 A 20050601