Global Patent Index - EP 1492994 A4

EP 1492994 A4 20100728 - METHOD AND APPARATUS FOR STAGE MIRROR MAPPING

Title (en)

METHOD AND APPARATUS FOR STAGE MIRROR MAPPING

Title (de)

VERFAHREN UND VORRICHTUNG ZUR BÜHNENSPIEGELABBILDUNG

Title (fr)

PROCEDE ET DISPOSITIF DE CARTOGRAPHIE DE MIROIR DE PLATINE

Publication

EP 1492994 A4 20100728 (EN)

Application

EP 03714507 A 20030404

Priority

  • US 0310212 W 20030404
  • US 37117202 P 20020409
  • US 21753102 A 20020813

Abstract (en)

[origin: WO03087710A2] Interferometer systems are described that comprise optical assemblies to measure multiple degrees of freedom of a stage mirror and the topography of a reflecting surface of a stage mirror represented by datum lines and datum lines with corresponding local rotations of the reflecting surface of the stage mirror about the datum lines with high lateral spatial resolution. The interferometer systems measure slopes of datum lines and local rotations of the reflecting surface about the datum lines using single pass interferometric measurements of angular changes of directions of beams reflected by the reflecting surfaces. Two or more datum lines on a reflecting surface with concomitant measures of local rotations may be used to characterize topographic features, and these may be measured in situ in a lithography tool or measured off line either before installation or after removal from a lithography tool. Interferometer systems are also described that comprise optical assemblies to measure multiple degrees of freedom of two and three stage mirrors and the topography of reflecting surfaces of the stage mirrors. Scanning in only two orthogonal axes is required for determination of the topography of reflecting surfaces. The two and three stage mirrors are arranged such that they are typically orthogonal or plane parallel to other surfaces of the two and three stage mirrors although other angles may be present such as 45 degrees. The topography of reflecting surfaces may be measured for mirrors that are used in end use applications other than in lithrography tools.

IPC 8 full level

G01B 9/02 (2006.01); G01B 11/00 (2006.01); G01B 11/24 (2006.01); G01B 11/30 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP)

G01B 9/02007 (2013.01); G01B 9/02019 (2013.01); G01B 9/02027 (2013.01); G01B 11/2441 (2013.01); G01B 11/306 (2013.01); G03F 7/70591 (2013.01); G03F 7/70716 (2013.01); G03F 7/70775 (2013.01); G01B 2290/70 (2013.01)

Citation (search report)

  • [XD] US 2001035959 A1 20011101 - HILL HENRY ALLEN [US]
  • [X] US 5464715 A 19951107 - NISHI KENJI [JP], et al
  • [X] US 5371588 A 19941206 - DAVIS CHRISTOPHER C [US], et al
  • [AD] ZANONI C: "DIFFERENTIAL INTERFEROMETER ARRANGEMENTS FOR DISTANCE AND ANGLE MEASUREMENTS: PRINCIPLES, ADVANTAGES AND APPLICATIONS", VDI BERICHTE, DUESSELDORF, DE, no. 749, 1 January 1989 (1989-01-01), pages 93 - 106, XP001028012, ISSN: 0083-5560
  • See references of WO 03087710A2

Designated contracting state (EPC)

DE

DOCDB simple family (publication)

WO 03087710 A2 20031023; WO 03087710 A3 20031218; EP 1492994 A2 20050105; EP 1492994 A4 20100728; JP 2005522683 A 20050728; JP 4458855 B2 20100428

DOCDB simple family (application)

US 0310212 W 20030404; EP 03714507 A 20030404; JP 2003584612 A 20030404