EP 1493060 A2 20050105 - Method and device for imaging a mask onto a substrate
Title (en)
Method and device for imaging a mask onto a substrate
Title (de)
Verfahren und Vorrichtung zum Abbilden einer Maske auf einem Substrat
Title (fr)
Procédé et dispositif pour la formation d'une image d'un masque sur un substrat
Publication
Application
Priority
- DE 10216096 A 20020411
- EP 0303775 W 20030411
Abstract (en)
[origin: WO03085456A2] The invention relates to a method for imaging a mask (1) onto a substrate (2) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the invention is to create a method and a device which enable the mask (1) and the smaller structures thereof to be imaged onto the substrate (2) in a precise manner, with high functional reliability, and which enable the distortions of the substrate (2) to be corrected. To this end, the illuminating unit (8) and the optical unit (9) are displaced in relation to the mask (1) and the substrate (2), distortions of the substrate (2) are detected, and the imaging of the mask (1) is distorted according to the detected distortions by means of the optical unit (9) and is adapted to the distortions of the substrate (2).
IPC 1-7
IPC 8 full level
CPC (source: EP US)
G03F 7/70258 (2013.01 - EP US); G03F 7/70275 (2013.01 - EP US); G03F 7/70358 (2013.01 - EP US); G03F 7/70791 (2013.01 - EP US); G03F 7/70991 (2013.01 - EP US)
Citation (search report)
See references of WO 03085456A2
Citation (examination)
US 2001052966 A1 20011220 - FUJITSUKA SEIJI [JP], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 03085456 A2 20031016; WO 03085456 A3 20040226; AU 2003227607 A1 20031020; CA 2482155 A1 20031016; CN 1659478 A 20050824; DE 10317050 A1 20031120; EP 1493060 A2 20050105; JP 2005527848 A 20050915; US 2005122495 A1 20050609
DOCDB simple family (application)
EP 0303775 W 20030411; AU 2003227607 A 20030411; CA 2482155 A 20030411; CN 03812896 A 20030411; DE 10317050 A 20030411; EP 03725009 A 20030411; JP 2003582582 A 20030411; US 51122605 A 20050112