Global Patent Index - EP 1494821 A4

EP 1494821 A4 20091125 - FLUID ASSISTED CRYOGENIC CLEANING

Title (en)

FLUID ASSISTED CRYOGENIC CLEANING

Title (de)

FLUIDUNTERSTÜTZTE KRYOGENE REINIGUNG

Title (fr)

NETTOYAGE CRYOGENIQUE ASSISTE PAR FLUIDE

Publication

EP 1494821 A4 20091125 (EN)

Application

EP 03728337 A 20030403

Priority

  • US 0310354 W 20030403
  • US 36985202 P 20020405
  • US 36985302 P 20020405
  • US 32422102 A 20021219
  • US 40314703 A 20030331

Abstract (en)

[origin: WO03086668A1] The present invention is directed to fluid assisted cryogenic cleaning of a substrate surface requiring precision cleaning such as semiconductors, metals, and dielectric films. The process comprises the steps of applying a fluid selected from the group consisting of high vapor pressure liquids, reactive gases, and vapors of reactive liquids onto the substrate surface followed by or simultaneously with cryogenic cleaning of the substrate surface to remove contaminants.

IPC 8 full level

B08B 3/00 (2006.01); B08B 3/08 (2006.01); B08B 3/04 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); B24C 1/00 (2006.01); C23G 5/00 (2006.01); C23G 5/028 (2006.01); H01L 21/02 (2006.01); H01L 21/304 (2006.01); H01L 21/00 (2006.01)

CPC (source: EP KR)

B08B 3/04 (2013.01 - EP); B08B 7/0092 (2013.01 - EP); B24C 1/003 (2013.01 - EP); C23G 5/00 (2013.01 - EP); H01L 21/02101 (2013.01 - EP); H01L 21/304 (2013.01 - KR); H01L 21/67051 (2013.01 - EP)

Citation (search report)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

DOCDB simple family (publication)

WO 03086668 A1 20031023; AU 2003233485 A1 20031027; CN 1665609 A 20050907; EP 1494821 A1 20050112; EP 1494821 A4 20091125; JP 2005522056 A 20050721; KR 20040098054 A 20041118

DOCDB simple family (application)

US 0310354 W 20030403; AU 2003233485 A 20030403; CN 03810362 A 20030403; EP 03728337 A 20030403; JP 2003583667 A 20030403; KR 20047015867 A 20030403