EP 1509815 A1 20050302 - PHOTOSENSITIVE LACQUER FOR PROVIDING A COATING ON A SEMICONDUCTOR SUBSTRATE OR A MASK
Title (en)
PHOTOSENSITIVE LACQUER FOR PROVIDING A COATING ON A SEMICONDUCTOR SUBSTRATE OR A MASK
Title (de)
PHOTOSENSITIVER LACK ZUR BESCHICHTUNG AUF EINEM HALBLEITER-SUBSTRAT ODER EINER MASKE
Title (fr)
VERNIS PHOTOSENSIBLE POUR ENDUIRE UN SUPPORT SEMI-CONDUCTEUR OU UN MASQUE
Publication
Application
Priority
- DE 0301781 W 20030530
- DE 10224217 A 20020531
Abstract (en)
[origin: WO03102694A1] The invention relates to a photosensitive lacquer (100) for providing a coating on a semiconductor substrate or a mask. The lacquer according to the invention comprises a photosensitive acidifier (D), a solvent (E) and at least two different base polymers. A first base polymer comprises cyclo-aliphatic basic structures (A) which substantially absorb light irradiated thereon at 248 nm and which are substantially transparent to light irradiated at 193 nm. A second base polymer comprises aromatic basic structures (B) which substantially absorb light irradiated thereon at 193 nm and which are substantially transparent to light irradiated at 248 nm. When such a lacquer (100) is applied to a substrate in a layer thickness of 50 to 400 nm and the percentage of the second base polymer comprising the aromatic basic structures is between 1 and 25 mole- %, and when exposed to a wavelength of 193 nm, a higher structure contrast and better etching stability is reached and defects are reduced. Exposure across the entire depth range of the lacquer (100) is likewise ensured.
IPC 1-7
IPC 8 full level
G03C 1/492 (2006.01); G03C 1/494 (2006.01); G03C 1/76 (2006.01); G03F 7/039 (2006.01); H01L 21/31 (2006.01); H01L 21/469 (2006.01)
CPC (source: EP US)
G03F 7/0392 (2013.01 - EP US); G03F 7/0395 (2013.01 - EP US)
Citation (search report)
See references of WO 03102694A1
Designated contracting state (EPC)
DE
DOCDB simple family (publication)
WO 03102694 A1 20031211; DE 10224217 A1 20031218; EP 1509815 A1 20050302; US 2005130444 A1 20050616; US 7169716 B2 20070130
DOCDB simple family (application)
DE 0301781 W 20030530; DE 10224217 A 20020531; EP 03755914 A 20030530; US 34204 A 20041129