EP 1512112 A4 20061102 - USE OF OVERLAY DIAGNOSTICS FOR ENHANCED AUTOMATIC PROCESS CONTROL
Title (en)
USE OF OVERLAY DIAGNOSTICS FOR ENHANCED AUTOMATIC PROCESS CONTROL
Title (de)
VERWENDUNG VON ÜBERLAGERUNGSDIAGNOSE FÜR ERWEITERTE AUTOMATISCHE PROZESSSTEUERUNG
Title (fr)
UTILISATION DE DIAGNOSTICS PAR RECOUVREMENT POUR AMELIORER LES COMMANDES AUTOMATIQUES DE PROCESSUS
Publication
Application
Priority
- US 0317899 W 20030605
- US 38628502 P 20020605
- US 39584702 P 20020711
- US 45668103 P 20030319
- US 43896203 A 20030514
- US 43896303 A 20030514
Abstract (en)
[origin: WO03104929A2] Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.
IPC 1-7
IPC 8 full level
G01B 11/00 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP)
G03F 7/70483 (2013.01); G03F 7/705 (2013.01); G03F 7/70516 (2013.01); G03F 7/70633 (2013.01)
Citation (search report)
- [A] US 2002001083 A1 20020103 - TABEI KOUWA [JP]
- [A] US 5329334 A 19940712 - YIM RANDY [US], et al
- [X] STARIKOV A ET AL: "ACCURACY OF OVERLAY MEASUREMENTS: TOOL AND MARK ASYMMETRY EFFECTS", OPTICAL ENGINEERING, SOC. OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS. BELLINGHAM, US, vol. 31, no. 6, 1 June 1992 (1992-06-01), pages 1298 - 1309, XP000278264, ISSN: 0091-3286
- See references of WO 03104929A2
Designated contracting state (EPC)
DE GB
DOCDB simple family (publication)
WO 03104929 A2 20031218; WO 03104929 A3 20040624; EP 1512112 A2 20050309; EP 1512112 A4 20061102; JP 2005529488 A 20050929; JP 4677231 B2 20110427
DOCDB simple family (application)
US 0317899 W 20030605; EP 03736896 A 20030605; JP 2004511937 A 20030605