EP 1516360 A1 20050323 - FLUOROPOLYMER INTERLAYER DIELECTRIC BY CHEMICAL VAPOR DEPOSITION
Title (en)
FLUOROPOLYMER INTERLAYER DIELECTRIC BY CHEMICAL VAPOR DEPOSITION
Title (de)
FLUORPOLYMER-ZWISCHENSCHICHTDIELEKTRIKUM DURCH CHEMISCHE GASPHASENABSCHEIDUNG
Title (fr)
DIELECTRIQUE INTERCOUCHES EN FLUOROPOLYMERES FORME AU MOYEN D'UN PROCEDE DE DEPOT CHIMIQUE EN PHASE VAPEUR
Publication
Application
Priority
US 0219702 W 20020621
Abstract (en)
[origin: WO2004001832A1] A process is disclosed for forming a fluoropolymer layer on a thin film device, comprising contacting said thin film device with a gas phase fluoromonomer, and initiating polymerization of said fluoromonomer with a free radical polymerization initiator whereby said fluoromonomer polymerizes to form said fluoropolymer layer on said thin film device.
IPC 1-7
IPC 8 full level
H01L 21/312 (2006.01); B05D 5/08 (2006.01); B05D 7/14 (2006.01); B05D 7/24 (2006.01)
CPC (source: EP)
B05D 5/083 (2013.01); H01L 21/0212 (2013.01); H01L 21/02271 (2013.01); B05D 1/60 (2013.01); B05D 7/14 (2013.01)
Citation (search report)
See references of WO 2004001832A1
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 2004001832 A1 20031231; AU 2002310491 A1 20040106; CA 2487486 A1 20031231; CN 100336184 C 20070905; CN 1628376 A 20050615; EP 1516360 A1 20050323; HK 1076921 A1 20060127; RU 2005101341 A 20050627; RU 2304323 C2 20070810
DOCDB simple family (application)
US 0219702 W 20020621; AU 2002310491 A 20020621; CA 2487486 A 20020621; CN 02829190 A 20020621; EP 02737569 A 20020621; HK 05108916 A 20051007; RU 2005101341 A 20020621