Global Patent Index - EP 1520281 A2

EP 1520281 A2 20050406 - LOW-FORCE ELECTROCHEMICAL MECHANICAL PROCESSING METHOD AND APPARATUS

Title (en)

LOW-FORCE ELECTROCHEMICAL MECHANICAL PROCESSING METHOD AND APPARATUS

Title (de)

ELEKTROCHEMISCHES MECHANISCHES VERFAHREN MIT GERINGER KRAFT UND APPARAT

Title (fr)

PROCEDE ET APPAREIL POUR LE TRAITEMENT MECANIQUE ET ELECTROCHIMIQUE DE FAIBLE FORCE

Publication

EP 1520281 A2 20050406 (EN)

Application

EP 02780399 A 20020927

Priority

  • US 0230952 W 20020927
  • US 32608701 P 20010928
  • US 15582802 A 20020523

Abstract (en)

[origin: WO03028048A2] The present invention relates to semiconductor integrated circuit technology and discloses an electrochemical mechanical processing system for uniformly distributing an applied force to a workpiece surface. The system includes a workpiece carrier for positioning or holding the workpiece surface and a workpiece-surface-influencing-device (WSID). The WSID is used to uniformly distribute the applied force to the workpiece surface and includes various layers that are used to process and apply a uniform and global force to the workpiece surface.

IPC 1-7

C25D 5/22

IPC 8 full level

C25D 5/06 (2006.01); B23H 5/08 (2006.01); B24B 37/04 (2012.01); B24B 49/16 (2006.01); C23F 1/08 (2006.01); C25D 5/22 (2006.01); C25D 7/12 (2006.01); H01L 21/304 (2006.01); H01L 21/3205 (2006.01)

CPC (source: EP KR US)

B23H 5/08 (2013.01 - EP US); B24B 37/046 (2013.01 - EP US); B24B 37/22 (2013.01 - EP US); B24B 37/26 (2013.01 - EP US); B24B 49/16 (2013.01 - EP US); C25D 5/22 (2013.01 - EP US); C25D 7/123 (2013.01 - EP US); H01L 21/304 (2013.01 - KR)

Citation (search report)

See references of WO 03028048A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR

DOCDB simple family (publication)

WO 03028048 A2 20030403; WO 03028048 A3 20050203; AU 2002343455 A1 20030407; CN 1701136 A 20051123; CN 1701136 B 20100714; EP 1520281 A2 20050406; JP 2005511888 A 20050428; KR 20040048909 A 20040610; TW 559922 B 20031101; US 2003064669 A1 20030403; US 7238092 B2 20070703

DOCDB simple family (application)

US 0230952 W 20020927; AU 2002343455 A 20020927; CN 02821390 A 20020927; EP 02780399 A 20020927; JP 2003531485 A 20020927; KR 20047004566 A 20020927; TW 91122401 A 20020927; US 15582802 A 20020523