EP 1522891 A1 20050413 - Positive resist composition and pattern forming method using the same
Title (en)
Positive resist composition and pattern forming method using the same
Title (de)
Positiv arbeitende Resistzusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
Title (fr)
Composition pour réserve de type positif et procédé de formation de motifs employant ladite composition
Publication
Application
Priority
JP 2003349022 A 20031008
Abstract (en)
A positive resist composition comprising: (A) a resin which increases a solubility of the resin (A) in an alkali developer by an action of an acid; (B-1) a triarylsulfonium salt having a fluorine atom in a cation part of the triarylsulfonium salt, wherein the triarylsulfonium salt generates one of: an aliphatic sulfonic acid having a fluorine atom; and an aromatic sulfonic acid having a fluorine atom upon irradiation with one of an actinic ray and a radiation; (C) anitrogen-containingbasiccompound; and (D) an organic solvent, and pattern forming method using the same.
IPC 1-7
IPC 8 full level
G03F 7/039 (2006.01); G03C 1/73 (2006.01); G03C 1/76 (2006.01); G03F 7/004 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
G03F 7/0045 (2013.01 - EP US); G03F 7/0046 (2013.01 - EP US); G03F 7/0392 (2013.01 - EP US); G03F 7/0395 (2013.01 - EP US); G03F 7/0397 (2013.01 - EP US)
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Citation (search report)
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Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 1522891 A1 20050413; JP 2005115016 A 20050428; JP 4612999 B2 20110112; US 2005079441 A1 20050414
DOCDB simple family (application)
EP 04023911 A 20041007; JP 2003349022 A 20031008; US 95834604 A 20041006