EP 1532488 A1 20050525 - OPTICAL SUBSYSTEM, PARTICULARLY FOR A PROJECTION EXPOSURE SYSTEM COMPRISING AT LEAST ONE OPTICAL ELEMENT THAT CAN BE BROUGHT INTO AT LEAST TWO POSITIONS
Title (en)
OPTICAL SUBSYSTEM, PARTICULARLY FOR A PROJECTION EXPOSURE SYSTEM COMPRISING AT LEAST ONE OPTICAL ELEMENT THAT CAN BE BROUGHT INTO AT LEAST TWO POSITIONS
Title (de)
OPTISCHES TEILSYSTEM INSBESONDERE FÜR EINE PROJEKTIONSBELICHTUNGSANLAGE MIT MINDESTENS EINEM IN MINDESTENS ZWEI STELLUNGEN VERBRINGBAREN OPTISCHEN ELEMENT
Title (fr)
SYSTEME PARTIEL OPTIQUE NOTAMMENT DESTINE A UN DISPOSITIF D'ECLAIRAGE DE PROJECTION COMPORTANT AU MOINS UN ELEMENT OPTIQUE POUVANT ETRE AMENE DANS AU MOINS DEUX POSITIONS
Publication
Application
Priority
- DE 10240002 A 20020827
- EP 0305387 W 20030523
Abstract (en)
[origin: WO2004021085A1] The invention relates to an optical subsystem, particularly for a projection exposure system for use in microlithography, having a pencil of rays (4) that passes through the optical subsystem, and having at least one optical element upon which the rays of the pencil of rays (4) impinge in a first area of use (12, 108.1, 152, 208.1, 308.1). The invention is characterized in that the optical element comprises at least one other area of use (14, 108.2, 154, 208.1, 308.1). The optical subsystem also comprises devices for bringing the optical element into at least two positions consisting of a first position and of a second/other position(s). In the first position, the pencil of rays impinges upon the surface of the optical element in the first area of use (12, 152, 108.1, 208.1, 308.1) and, in the second/other position(s), the pencil of rays impinges upon the surface of the optical element in a second/other area of use (14, 154, 108.2, 208.2, 308.2).
IPC 1-7
IPC 8 full level
G21K 1/06 (2006.01); G02B 7/00 (2006.01); G02B 17/06 (2006.01); G02B 27/00 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
G02B 17/0657 (2013.01 - EP US); G02B 27/0006 (2013.01 - EP US); G03F 7/702 (2013.01 - EP US); G03F 7/70233 (2013.01 - EP US); G03F 7/70825 (2013.01 - EP US); G03F 7/70925 (2013.01 - EP US); G03F 7/70975 (2013.01 - EP US)
Citation (search report)
See references of WO 2004021085A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2004021085 A1 20040311; AU 2003238379 A1 20040319; DE 10240002 A1 20040311; EP 1532488 A1 20050525; JP 2005536899 A 20051202; US 2006001854 A1 20060105; US 2007283591 A1 20071213; US 7362414 B2 20080422
DOCDB simple family (application)
EP 0305387 W 20030523; AU 2003238379 A 20030523; DE 10240002 A 20020827; EP 03732444 A 20030523; JP 2004531771 A 20030523; US 6532705 A 20050224; US 79647507 A 20070427