EP 1532489 A2 20050525 - PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME
Title (en)
PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME
Title (de)
OPTISCHES PROJEKTIONSSYSTEM, PHOTOLITHOGRAPHISCHE METHODE, BELICHTUNGSAPPARAT UND BELICHTUNGSMETHODE UNTER VERWENDUNG DIESES BELICHTUNGSAPPARATS
Title (fr)
SYSTEME OPTIQUE DE PROJECTION ET PROCEDE ASSOCIE POUR LA PHOTOLITHOGRAPHIE, ET APPAREIL D'EXPOSITION ET PROCEDE ASSOCIE
Publication
Application
Priority
- GB 0311470 A 20030519
- JP 0310665 W 20030822
- JP 2002242925 A 20020823
Abstract (en)
[origin: WO2004019128A2] Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
IPC 1-7
IPC 8 full level
G02B 13/14 (2006.01); G02B 13/18 (2006.01); G02B 13/24 (2006.01); G02B 17/08 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G02B 17/08 (2013.01 - EP US); G02B 17/0892 (2013.01 - EP US); G02B 21/33 (2013.01 - EP US); G03F 7/20 (2013.01 - KR); G03F 7/70225 (2013.01 - EP US); G03F 7/70341 (2013.01 - EP US); G02B 13/22 (2013.01 - EP US)
Citation (search report)
See references of WO 2004019128A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2004019128 A2 20040304; WO 2004019128 A3 20041028; AU 2003256081 A1 20040311; AU 2003256081 A8 20040311; CN 100462844 C 20090218; CN 1668984 A 20050914; EP 1532489 A2 20050525; JP 2005536775 A 20051202; JP 2010061159 A 20100318; JP 2010097221 A 20100430; JP 4803301 B2 20111026; KR 20050035890 A 20050419; TW 200403547 A 20040301; TW 200426542 A 20041201; TW I242691 B 20051101; TW I249082 B 20060211; US 2005248856 A1 20051110; US 2008049306 A1 20080228; US 2008049336 A1 20080228; US 2008068573 A1 20080320; US 2008068576 A1 20080320; US 2008068724 A1 20080320; US 2008094696 A1 20080424; US 7362508 B2 20080422; US 7551362 B2 20090623; US 7580197 B2 20090825; US 7609455 B2 20091027; US 7619827 B2 20091117; US 7688517 B2 20100330; US 7701640 B2 20100420
DOCDB simple family (application)
JP 0310665 W 20030822; AU 2003256081 A 20030822; CN 03817253 A 20030822; EP 03792812 A 20030822; JP 2004530609 A 20030822; JP 2009276076 A 20091204; JP 2009276077 A 20091204; KR 20057003082 A 20050223; TW 92123099 A 20030822; TW 93118060 A 20030822; US 52537205 A 20050223; US 90767907 A 20071016; US 90779707 A 20071017; US 90780107 A 20071017; US 90790707 A 20071018; US 90790807 A 20071018; US 97602807 A 20071019