Global Patent Index - EP 1556394 A4

EP 1556394 A4 20080220 - ASYMMETRIC GROUP 8 (VIII) METALLOCENE COMPOUNDS

Title (en)

ASYMMETRIC GROUP 8 (VIII) METALLOCENE COMPOUNDS

Title (de)

ASYMMETRISCHE GRUPPE-8-(VIII-)METALLOCENVERBINDUNGEN

Title (fr)

COMPOSES METALLOCENE ASYMETRIQUES DU GROUPE 8 (VIII)

Publication

EP 1556394 A4 20080220 (EN)

Application

EP 03810819 A 20031030

Priority

  • US 0334497 W 20031030
  • US 42294602 P 20021031
  • US 42294702 P 20021031
  • US 42628402 P 20021114
  • US 42746102 P 20021118
  • US 44632003 P 20030207
  • US 45371803 P 20030418
  • US 45371903 P 20030418
  • US 45371703 P 20030418
  • US 68577703 A 20031016
  • US 68578503 A 20031016
  • US 68625403 A 20031016

Abstract (en)

[origin: WO2004042354A2] A method for producing Group 8 (VIII) metallocene or metallocene-like compounds employs a compound that includes a Cp' anion, such as found, together with a counterion, in a cyclopentadienide or cyclopentadienide-like salt. In one embodiment, the method includes reacting a metal salt, a (Cp) compound, such as a substituted or unsubstituted cyclopentadiene or indene, and a ligand (L) to form an intermediate compound and reacting the intermediate compound with a Cp' compound, eg., a cyclopentadienide or cyclopentadienide-like salt, where the metal salt can be is a ruthenium, an osmium or an iron halide or nitrate and L is an electron pair donor. Unsubstituted, mono-substituted as well as symmetrically or asymmetrically di- or multi-substituted metallocenes or metallocene-like compounds can be produced. In another embodiment, unsubstituted or symmetrically substituted metallocenes are formed by reacting MX2(PPh3)m with a Cp' compound, where m = 3 or 4. The method can be used to form precursors for chemical vapor deposition of thin films.

IPC 1-7

C07F 17/02; C23C 14/14; C23C 14/26

IPC 8 full level

C07F 17/02 (2006.01); C23C 16/18 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)

CPC (source: EP KR)

C07F 17/02 (2013.01 - EP KR); C23C 16/18 (2013.01 - EP); C23C 16/40 (2013.01 - EP); C23C 16/406 (2013.01 - EP); C23C 16/45553 (2013.01 - EP)

Citation (search report)

  • [X] US 6207232 B1 20010327 - KADOKURA HIDEKIMI [JP]
  • [X] KAUFFMANN, THOMAS ET AL: "Multi electron ligands. XV. The reactivity of spiro[2.4]hepta-4,6-diene toward organolithium and organoelementlithium compounds", CHEMISCHE BERICHTE , 118(11), 4517-30 CODEN: CHBEAM; ISSN: 0009-2940, 1985, XP002463776
  • [X] SATO, MASARU ET AL: "Syntheses and NMR spectra of the substituted methylferrocenes", BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN , 43(4), 1142-7 CODEN: BCSJA8; ISSN: 0009-2673, 1970, XP002463777
  • [X] DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; PATIN, HENRI ET AL: "Metallocenes. VIII. Clemmensen reduction of benzoylferrocene and 1,1-diacylferrocenes. Structure of the dimerization compounds", XP002463779, retrieved from STN Database accession no. 79:137262
  • [X] HUFFMAN, J. W. ET AL: "Reactions of 2-methylchloroferrocene. Evidence for the ferrocyne intermediate", JOURNAL OF ORGANIC CHEMISTRY , 36(26), 4068-72 CODEN: JOCEAH; ISSN: 0022-3263, 1971, XP002463778
  • [PX] DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; ATWOOD, JIM D. ET AL: "Novel precursors for high k dielectrics and metal electrodes Part II: Deposition", XP002463780, retrieved from STN Database accession no. 140:21747 & BULLETIN DE LA SOCIETE CHIMIQUE DE FRANCE , (7-8)(PT. 2), 2413-17 CODEN: BSCFAS; ISSN: 0037-8968, 1973 & PROCEEDINGS - ELECTROCHEMICAL SOCIETY , 2003-8(CHEMICAL VAPOR DEPOSITION XVI AND EUROCVD 14, VOLUME 2), 847-854 CODEN: PESODO; ISSN: 0161-6374, 2003
  • See references of WO 2004041832A2

Designated contracting state (EPC)

DE FR GB IE IT

DOCDB simple family (publication)

WO 2004042354 A2 20040521; WO 2004042354 A3 20040923; AU 2003301873 A1 20040607; AU 2003301873 A8 20040607; AU 2003301874 A1 20040607; AU 2003301874 A8 20040607; AU 2003301884 A1 20040607; AU 2003301884 A8 20040607; EP 1556394 A2 20050727; EP 1556394 A4 20080220; EP 1556395 A2 20050727; EP 1556395 A4 20080220; EP 1556395 B1 20180912; EP 1556527 A2 20050727; EP 1556527 A4 20110525; EP 1556527 B1 20121212; JP 2006504806 A 20060209; JP 2006511598 A 20060406; JP 2006519303 A 20060824; JP 4538407 B2 20100908; JP 4542506 B2 20100915; JP 4560484 B2 20101013; KR 100995223 B1 20101117; KR 100997838 B1 20101201; KR 101150551 B1 20120703; KR 20050074975 A 20050719; KR 20050075763 A 20050721; KR 20050084901 A 20050829; TW 200420746 A 20041016; TW I274082 B 20070221; WO 2004041753 A2 20040521; WO 2004041753 A3 20040902; WO 2004041753 A9 20041125; WO 2004041832 A2 20040521; WO 2004041832 A3 20040923

DOCDB simple family (application)

US 0334498 W 20031030; AU 2003301873 A 20031030; AU 2003301874 A 20031030; AU 2003301884 A 20031030; EP 03810818 A 20031030; EP 03810819 A 20031030; EP 03810820 A 20031030; JP 2005502215 A 20031030; JP 2005502216 A 20031030; JP 2005502217 A 20031030; KR 20057007501 A 20031030; KR 20057007504 A 20031030; KR 20057007554 A 20031030; TW 92130102 A 20031029; US 0334494 W 20031030; US 0334497 W 20031030