EP 1573395 A4 20100929 - SCATTEROMETRY ALIGNMENT FOR IMPRINT LITHOGRAPHY
Title (en)
SCATTEROMETRY ALIGNMENT FOR IMPRINT LITHOGRAPHY
Title (de)
STREUUNGSMESSAUSRICHTUNG FÜR DIE DRUCKLITHOGRAPHIE
Title (fr)
ALIGNEMENT PAR DIFFUSIOMETRIE POUR LITHOGRAPHIE PAR EMPREINTE
Publication
Application
Priority
- US 0323948 W 20030731
- US 21078502 A 20020801
- US 21078002 A 20020801
- US 21089402 A 20020801
Abstract (en)
[origin: WO2004013693A2] Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
IPC 8 full level
G01B 11/00 (2006.01); G01N 21/86 (2006.01); G03F 1/00 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01)
IPC 8 main group level
G03F (2006.01)
CPC (source: EP KR)
B82Y 10/00 (2013.01 - EP); B82Y 30/00 (2013.01 - EP); B82Y 40/00 (2013.01 - EP); G03F 7/0002 (2013.01 - EP); G03F 7/20 (2013.01 - KR); G03F 9/7049 (2013.01 - EP); G03F 9/7065 (2013.01 - EP)
Citation (search report)
- [XY] US 2002098426 A1 20020725 - SREENIVASAN S V [US], et al
- [XY] US 2002093122 A1 20020718 - CHOI BYUNG J [US], et al
- [XY] US 2002062204 A1 20020523 - NAKAJIMA SHINICHI [JP]
- [X] US 6153886 A 20001128 - HAGIWARA SHIGERU [JP], et al
- [XY] JP H02152220 A 19900612 - CANON KK
- [XY] WHITE D L ET AL: "Novel alignment system for imprint lithography", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US LNKD- DOI:10.1116/1.1319706, vol. 18, no. 6, 1 November 2000 (2000-11-01), pages 3552 - 3556, XP002204287, ISSN: 1071-1023
- [IY] CHOI B J ET AL: "Layer-to-layer alignment for step and flash imprint lithography", PROCEEDINGS OF THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING (SPIE), SPIE, USA LNKD- DOI:10.1117/12.436662, vol. 4343, 1 January 2001 (2001-01-01), pages 436 - 442, XP002275988, ISSN: 0277-786X
- See references of WO 2004013693A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2004013693 A2 20040212; WO 2004013693 A3 20060119; AU 2003261317 A1 20040223; AU 2003261317 A8 20040223; EP 1573395 A2 20050914; EP 1573395 A4 20100929; JP 2006516065 A 20060615; JP 2011101016 A 20110519; JP 5421221 B2 20140219; KR 20050026088 A 20050314; TW 200406651 A 20040501; TW I266970 B 20061121
DOCDB simple family (application)
US 0323948 W 20030731; AU 2003261317 A 20030731; EP 03767009 A 20030731; JP 2004526254 A 20030731; JP 2010248314 A 20101105; KR 20057001792 A 20050131; TW 92120993 A 20030731