EP 1577929 A3 20061011 - Electron beam exposure apparatus

Title (en)

Electron beam exposure apparatus

Title (de)

Elektronenstrahlbelichtungsapparat

Title (fr)

Appareil d'exposition pour faisceau d'électrons

Publication

EP 1577929 A3 20061011 (EN)

Application

EP 05005017 A 20050308

Priority

JP 2004074209 A 20040316

Abstract (en)

[origin: EP1577929A2] An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.

IPC 8 full level

G03F 7/20 (2006.01); H01J 37/02 (2006.01); H01J 37/16 (2006.01); H01J 37/20 (2006.01); H01J 37/317 (2006.01); H01L 21/027 (2006.01); H01L 21/68 (2006.01)

CPC (source: EP US)

B82Y 10/00 (2013.01 - EP US); B82Y 40/00 (2013.01 - EP US); H01J 37/023 (2013.01 - EP US); H01J 37/3174 (2013.01 - EP US); H01J 2237/0216 (2013.01 - EP US); H01J 2237/0245 (2013.01 - EP US)

Citation (search report)

[XAY] US 5508518 A 19960416 - KENDALL RODNEY A [US]
[Y] EP 1143492 A1 20011010 - NIKON CORP [JP]
[Y] EP 0797236 A2 19970924 - FUJITSU LTD [JP], et al
[Y] GB 1458778 A 19761215 - DECCA LTD
[PA] US 2004145715 A1 20040729 - TAKASHIMA TSUNEO [JP]
[A] EP 1215805 A2 20020619 - CANON KK [JP]
[Y] PATENT ABSTRACTS OF JAPAN vol. 016, no. 513 (E - 1283) 22 October 1992 (1992-10-22)
[YA] PATENT ABSTRACTS OF JAPAN vol. 1999, no. 09 30 July 1999 (1999-07-30)
[Y] PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05)
[A] PATENT ABSTRACTS OF JAPAN vol. 2003, no. 01 14 January 2003 (2003-01-14)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

EP 1577929 A2 20050921; EP 1577929 A3 20061011; EP 1577929 B1 20090923; DE 602005016740 D1 20091105; JP 2005268268 A 20050929; US 2005205809 A1 20050922; US 7230257 B2 20070612

DOCDB simple family (application)

EP 05005017 A 20050308; DE 602005016740 T 20050308; JP 2004074209 A 20040316; US 7464505 A 20050309