EP 1578524 A4 20070328 - PLASMA REACTOR AND ELECTRODE PLATE USED IN THE SAME
Title (en)
PLASMA REACTOR AND ELECTRODE PLATE USED IN THE SAME
Title (de)
PLASMAREAKTOR UND ELEKTRODENPLATTE DAFÜR
Title (fr)
REACTEUR A PLASMA ET PLAQUE D'ELECTRODE UTILISEE DANS CE DERNIER
Publication
Application
Priority
- KR 0302742 W 20031213
- KR 20020079679 A 20021213
- KR 20003090117 A 20031211
IPC 1-7
IPC 8 full level
B01D 53/32 (2006.01); B01J 19/08 (2006.01); B01J 19/24 (2006.01); F01N 3/08 (2006.01); H05H 1/24 (2006.01)
CPC (source: EP US)
B01D 53/32 (2013.01 - EP); B01J 19/088 (2013.01 - EP); B01J 19/249 (2013.01 - EP); F01N 3/0892 (2013.01 - EP); H05H 1/2418 (2021.05 - EP); H05H 1/2437 (2021.05 - EP); H05H 1/2441 (2021.05 - EP US); B01J 2219/0813 (2013.01 - EP); B01J 2219/0835 (2013.01 - EP); B01J 2219/0849 (2013.01 - EP); B01J 2219/0875 (2013.01 - EP); B01J 2219/0894 (2013.01 - EP); B01J 2219/2453 (2013.01 - EP); B01J 2219/2458 (2013.01 - EP); B01J 2219/2493 (2013.01 - EP); F01N 2240/28 (2013.01 - EP)
Citation (search report)
- [X] EP 0431951 A2 19910612 - JAPAN RES DEV CORP [JP]
- [X] WO 02074435 A1 20020926 - ACCENTUS PLC [GB], et al
- See references of WO 2004054703A1
Citation (examination)
US 2002174938 A1 20021128 - XIAOBIN LI BOB [US], et al
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
DOCDB simple family (application)
EP 03777435 A 20031213