EP 1598629 B1 20051214 - Method of chemical cleaning of a gas and vapor installation
Title (en)
Method of chemical cleaning of a gas and vapor installation
Title (de)
Verfahren zum chemischen Reinigen einer Gas- und Dampfanlage
Title (fr)
Procédé de nettoyage chimique d'une installation de gaz et de vapeur
Publication
Application
Priority
EP 04011890 A 20040519
Abstract (en)
The cleaning process involves filling the plant with demineralized water, checking seals, flushing with two system volumes of demineralized water, dosing a degreaser into the pump (1), heating to 50-80 deg. C, dosing in a cleaning fluid, checking iron concentration, expelling HF acids, restarting the circulation and raising the pH value to 10.0. A passive layer of hydrogen peroxide is then dosed in to form a passive layer on the metal until a positive Redox potential of more than 10 mV is reached. The system is then flushed out again.
IPC 1-7
IPC 8 full level
F22B 37/48 (2006.01); F22B 37/52 (2006.01); F28G 9/00 (2006.01)
CPC (source: EP)
F22B 37/52 (2013.01); F28G 9/00 (2013.01)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 1598629 A1 20051123; EP 1598629 B1 20051214; AT E313056 T1 20051215; DE 502004000183 D1 20060202; ES 2255694 T3 20060701
DOCDB simple family (application)
EP 04011890 A 20040519; AT 04011890 T 20040519; DE 502004000183 T 20040519; ES 04011890 T 20040519