Global Patent Index - EP 1603749 A2

EP 1603749 A2 20051214 - DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS

Title (en)

DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS

Title (de)

VERBESSERUNG DER ENTWICKLUNG VON STRAHLUNGSEMPFINDLICHEN ELEMENTEN

Title (fr)

AMELIORATION DU DEVELOPPEMENT D'ELEMENTS SENSIBLES AU RAYONNEMENT

Publication

EP 1603749 A2 20051214 (EN)

Application

EP 04719888 A 20040312

Priority

  • CA 2004000381 W 20040312
  • CA 0300373 W 20030314
  • US 64791003 A 20030825

Abstract (en)

[origin: WO2004081662A2] A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polivinyl acetal polymers capable of being dissolved in an alkaline acqueous solution and a development-enhancing compound. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

IPC 1-7

B41C 1/10; G03F 7/004

IPC 8 full level

B41C 1/10 (2006.01); B41M 5/36 (2006.01); G03F 7/004 (2006.01)

IPC 8 main group level

G03F (2006.01)

CPC (source: EP)

B41C 1/1008 (2013.01); B41M 5/368 (2013.01); B41C 2210/02 (2013.01); B41C 2210/06 (2013.01); B41C 2210/22 (2013.01); B41C 2210/24 (2013.01)

Citation (search report)

See references of WO 2004081662A2

Citation (examination)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

WO 2004081662 A2 20040923; WO 2004081662 A3 20041202; EP 1603749 A2 20051214; JP 2006520485 A 20060907; JP 2010146013 A 20100701; JP 4473262 B2 20100602

DOCDB simple family (application)

CA 2004000381 W 20040312; EP 04719888 A 20040312; JP 2006504077 A 20040312; JP 2010000879 A 20100106