EP 1609990 B1 20090812 - VACUUM DEVICE AND VACUUM PUMP
Title (en)
VACUUM DEVICE AND VACUUM PUMP
Title (de)
VAKUUMVORRICHTUNG UND VAKUUMPUMPE
Title (fr)
DISPOSITIF SOUS VIDE ET POMPE SOUS VIDE
Publication
Application
Priority
- JP 2004002484 W 20040301
- JP 2003055749 A 20030303
Abstract (en)
[origin: EP1609990A1] A vacuum apparatus has a vacuum chamber provided with a gas inlet and a gas outlet, and mechanical vacuum pumps in a plurality of stages for reducing a pressure inside the vacuum chamber and maintaining the pressure-reduced state. The vacuum apparatus has an ejector pump (60) connected to a discharge port (57) of a screw pump (A) as the vacuum pump at the last stage among the vacuum pumps. The vacuum apparatus is reduced in power consumption and used in the semiconductor manufacturing field and so on. <IMAGE>
IPC 8 full level
F04B 37/16 (2006.01); F04C 18/16 (2006.01); F04B 37/14 (2006.01); F04C 18/18 (2006.01); F04C 23/00 (2006.01); F04C 25/02 (2006.01); F04D 19/02 (2006.01); F04D 19/04 (2006.01); F04D 25/16 (2006.01); F04F 5/04 (2006.01); F04F 5/20 (2006.01); F04F 5/54 (2006.01)
CPC (source: EP US)
F04B 37/14 (2013.01 - EP US); F04C 23/005 (2013.01 - EP US); F04D 19/046 (2013.01 - EP US); F04F 5/20 (2013.01 - EP US); F04F 5/54 (2013.01 - EP US); F04C 18/16 (2013.01 - EP US); F04C 2220/12 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 1609990 A1 20051228; EP 1609990 A4 20070718; EP 1609990 B1 20090812; DE 602004022519 D1 20090924; JP 2004263635 A 20040924; TW 200506205 A 20050216; US 2006182638 A1 20060817; WO 2004079192 A1 20040916
DOCDB simple family (application)
EP 04716009 A 20040301; DE 602004022519 T 20040301; JP 2003055749 A 20030303; JP 2004002484 W 20040301; TW 93105511 A 20040303; US 54822505 A 20051020