EP 1614150 A2 20060111 - DEVICE AND METHOD FOR CLEANING AND DRYING OBJECTS USED TO PRODUCE SEMICONDUCTORS, ESPECIALLY TRANSPORT AND CLEANING CONTAINERS FOR WAFERS
Title (en)
DEVICE AND METHOD FOR CLEANING AND DRYING OBJECTS USED TO PRODUCE SEMICONDUCTORS, ESPECIALLY TRANSPORT AND CLEANING CONTAINERS FOR WAFERS
Title (de)
VORRICHTUNG UND VERFAHREN ZUM REINIGEN UND TROCKNEN VON BEI DER HERSTELLUNG VON HALBLEITERN VERWENDETEN GEGENSTÄNDEN, INSBESONDERE VON TRANSPORT- UND REINIGUNGSBEHÄLTERN FÜR WAFER
Title (fr)
DISPOSITIF ET PROCEDE DE NETTOYAGE ET DE SECHAGE D'OBJETS UTILISES AU COURS DE LA FABRICATION DE SEMICONDUCTEURS, EN PARTICULIER, DE RECIPIENTS DE TRANSPORT ET DE NETTOYAGE POUR PLAQUETTES
Publication
Application
Priority
- EP 2004003764 W 20040408
- DE 10317275 A 20030411
- DE 10347464 A 20031002
Abstract (en)
[origin: WO2005001888A2] The invention relates to a device and a method for cleaning objects used to produce semiconductors, especially transport and cleaning containers for wafers, LCD substrates and photomasks. Said objects are cleaned in a treatment chamber (40) by means of a liquid, and are then dried. Means for circulating a gas inside the treatment chamber (40) and a condensation drier (64) for the gas are provided in the treatment chamber (40).
IPC 1-7
IPC 8 full level
B08B 9/08 (2006.01); B08B 9/093 (2006.01); H01L 21/00 (2006.01)
IPC 8 main group level
H01L (2006.01)
CPC (source: EP US)
B08B 9/0861 (2013.01 - EP US); B08B 9/0933 (2013.01 - EP US)
Citation (search report)
See references of WO 2005001888A2
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 2005001888 A2 20050106; WO 2005001888 A3 20050317; DE 502004004812 D1 20071011; EP 1614150 A2 20060111; EP 1614150 B1 20070829; US 2006185692 A1 20060824; US 8161985 B2 20120424
DOCDB simple family (application)
EP 2004003764 W 20040408; DE 502004004812 T 20040408; EP 04762977 A 20040408; US 24762205 A 20051010