Global Patent Index - EP 1627425 A2

EP 1627425 A2 20060222 - METHOD FOR THE PRODUCTION OF A CHIP ARRANGEMENT AND VARNISH FOR CARRYING OUT SAID METHOD

Title (en)

METHOD FOR THE PRODUCTION OF A CHIP ARRANGEMENT AND VARNISH FOR CARRYING OUT SAID METHOD

Title (de)

VERFAHREN ZUM HERSTELLEN EINER CHIPANORDNUNG UND LACK MIT MAGNETISCH LEITFÄHIGEN PARTIKELN ZUR ELEKTRISCHEN KONTAKTIERUNG DER CHIPS

Title (fr)

PROCEDE DE PRODUCTION D'UN ENSEMBLE DE PUCES ET VERNIS PERMETTANT DE METTRE EN OEUVRE CE PROCEDE

Publication

EP 1627425 A2 20060222 (DE)

Application

EP 04731597 A 20040507

Priority

  • EP 2004004879 W 20040507
  • DE 10323842 A 20030523

Abstract (en)

[origin: WO2004105119A2] The invention relates to a method for the production of a chip arrangement (1) comprising at least two semi-conductor chips (2) having, respectively, at least one electric contact point (3). The semi-conductor chips (2) and a contacting layer (6) are arranged in such a manner that the semi-conductor chips (2) face towards the contact points thereof (3) and the contact points (3) are connected to each other via the contacting layer (6). The contacting layer (6) is made of magnetically conductive particles (4), a first insulating material (5a) and a second insulating material (5b). The particles (4) are covered by the second insulating material (5b) and then, arranged together with the covering in the second insulating material (5b). The insulating materials (5a, 5b) are melted in an area between the contact points (3) by means of heat treatment after the contact point(s) have been coated and the position of at least one particle (4) is altered with the aid of a magnetic field in such a manner that the contact points (3) are electrically connected to each other by the at least one particle (3). The insulating materials (5a, 5b) are then solidified by cooling.

IPC 1-7

H01L 21/58

IPC 8 full level

C09D 5/23 (2006.01); H01L 21/60 (2006.01); H01L 21/98 (2006.01); H01L 25/065 (2006.01)

CPC (source: EP)

H01L 24/28 (2013.01); H01L 24/31 (2013.01); H01L 24/83 (2013.01); H01L 25/50 (2013.01); H01L 25/0657 (2013.01); H01L 2224/8319 (2013.01); H01L 2224/838 (2013.01); H01L 2924/01004 (2013.01); H01L 2924/01005 (2013.01); H01L 2924/01027 (2013.01); H01L 2924/01032 (2013.01); H01L 2924/01047 (2013.01); H01L 2924/01058 (2013.01); H01L 2924/01068 (2013.01); H01L 2924/01077 (2013.01); H01L 2924/0781 (2013.01)

Citation (search report)

See references of WO 2004105119A2

Designated contracting state (EPC)

CH DE FR GB IT LI NL

DOCDB simple family (publication)

WO 2004105119 A2 20041202; WO 2004105119 A3 20050616; DE 10323842 B3 20050120; DE 502004001367 D1 20061012; EP 1627425 A2 20060222; EP 1627425 B1 20060830; TW 200539403 A 20051201

DOCDB simple family (application)

EP 2004004879 W 20040507; DE 10323842 A 20030523; DE 502004001367 T 20040507; EP 04731597 A 20040507; TW 93115291 A 20040528