EP 1644554 A1 20060412 - METHOD FOR DEPOSITION OF TITANIUM OXIDE BY A PLASMA SOURCE
Title (en)
METHOD FOR DEPOSITION OF TITANIUM OXIDE BY A PLASMA SOURCE
Title (de)
VERFAHREN ZUR ABSCHEIDUNG VON TITANOXID DURCH EINE PLASMAQUELLE
Title (fr)
PROCEDE DE DEPOT D'OXYDE DE TITANE PAR SOURCE PLASMA
Publication
Application
Priority
- FR 2004001673 W 20040630
- FR 0307948 A 20030701
Abstract (en)
[origin: FR2857030A1] The deposition on a substrate of a coating with a base of semiconductor metal oxide, preferably titanium oxide, is carried out by depositing the coating with photocatalytic properties using chemical deposition in the vapor phase, preferably from a gas mixture containing at least one organometallic and/or metallic halogen of the metal oxide precursor. The deposition is plasma assisted. Independent claims are also included for: (a) A substrate coated by the above method; (b) A monolithic, multiple or laminated anti-stain and/or anti-mist glazing incorporating the substrate.
IPC 1-7
IPC 8 full level
C23C 16/40 (2006.01)
CPC (source: EP KR US)
C23C 16/0272 (2013.01 - KR); C23C 16/405 (2013.01 - EP KR US); C23C 16/50 (2013.01 - KR); C23C 16/4481 (2013.01 - KR); Y02T 50/60 (2013.01 - US)
Citation (search report)
See references of WO 2005012593A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
FR 2857030 A1 20050107; FR 2857030 B1 20061027; CN 1816645 A 20060809; CN 1816645 B 20100428; EP 1644554 A1 20060412; JP 2007516343 A 20070621; KR 20060121660 A 20061129; US 2007092734 A1 20070426; US 7976909 B2 20110712; WO 2005012593 A1 20050210
DOCDB simple family (application)
FR 0307948 A 20030701; CN 200480019034 A 20040630; EP 04767517 A 20040630; FR 2004001673 W 20040630; JP 2006518268 A 20040630; KR 20057025270 A 20051229; US 56286804 A 20040630