Global Patent Index - EP 1664380 A2

EP 1664380 A2 20060607 - METHOD AND DEVICE FOR DEPOSITING SINGLE COMPONENT OR MULTICOMPONENT LAYERS AND SERIES OF LAYERS USING NON-CONTINUOUS INJECTION OF LIQUID AND DISSOLVED STARTING MATERIAL BY A MULTI-CHANNEL INJECTION UNIT

Title (en)

METHOD AND DEVICE FOR DEPOSITING SINGLE COMPONENT OR MULTICOMPONENT LAYERS AND SERIES OF LAYERS USING NON-CONTINUOUS INJECTION OF LIQUID AND DISSOLVED STARTING MATERIAL BY A MULTI-CHANNEL INJECTION UNIT

Title (de)

VERFAHREN UND VORRICHTUNG ZUR SCHICHTENABSCHEIDUNG UNTER VERWENDUNG VON NICHT-KONTINUIERLICHER INJEKTION

Title (fr)

PROCEDE ET DISPOSITIF POUR DEPOSER DES COUCHES OU DES SERIES DE COUCHES MONOCOMPOSANTS OU MULTICOMPOSANTS PAR INJECTION NON CONTINUE DE SUBSTANCES DE DEPART LIQUIDES OU DISSOUTES AU MOYEN D'UNE UNITE D'INJECTION A PLUSIEURS CANAUX

Publication

EP 1664380 A2 20060607 (DE)

Application

EP 04787104 A 20040907

Priority

  • EP 2004052063 W 20040907
  • DE 10342890 A 20030917
  • DE 102004021578 A 20040503

Abstract (en)

[origin: WO2005026401A2] The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber (2). Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a tempered vaporization chamber (4) by means of non-continuous injection of a liquid starting material (3) or a starting material (3) dissolved in a liquid using a respective injector unit (5). Said vapor is guided to the process chamber by means of a carrier gas (7). It is important to individually adjust or vary the material flow parameters, such as injection frequency and the pulse/pause ratio and the phase relation of the pulse/pauses to the pulse/pauses of the other injector unit (s), determining the time response of the flow of material through each injector unit (5). The pressure in the process chamber (2) is less than 100 mbars, the process chamber (2) is tempered and several series of layers are deposited on the substrate (1) during one process step.

IPC 1-7

C23C 16/52

IPC 8 full level

C23C 16/448 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01)

CPC (source: EP KR US)

C23C 16/4411 (2013.01 - EP KR US); C23C 16/4481 (2013.01 - EP KR US); C23C 16/455 (2013.01 - KR); C23C 16/52 (2013.01 - EP KR US)

Citation (search report)

See references of WO 2005026401A2

Designated contracting state (EPC)

DE FR GB NL

DOCDB simple family (publication)

WO 2005026401 A2 20050324; WO 2005026401 A3 20050609; WO 2005026401 B1 20050811; EP 1664380 A2 20060607; KR 20060079201 A 20060705; US 2006249081 A1 20061109; US 7410670 B2 20080812

DOCDB simple family (application)

EP 2004052063 W 20040907; EP 04787104 A 20040907; KR 20067004379 A 20060302; US 37775906 A 20060316