EP 1665354 A2 20060607 - METHODS OF FILLING GAPS AND METHODS OF DEPOSITING MATERIALS USING HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION
Title (en)
METHODS OF FILLING GAPS AND METHODS OF DEPOSITING MATERIALS USING HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION
Title (de)
VERFAHREN ZUM FÜLLEN VON LÜCKEN UND VERFAHREN ZUR ABSCHEIDUNG VON MATERIALIEN UNTER VERWENDUNG EINER HOCHDICHTEN CHEMISCHEN PLASMA-GASPHASENABSCHEIDUNG
Title (fr)
PROCEDES POUR REMPLIR DES INTERSTICES, ET PROCEDES POUR DEPOSER DES MATERIAUX AU MOYEN D'UN PROCESSUS DE DEPOT CHIMIQUE EN PHASE VAPEUR ASSISTE PAR PLASMA HAUTE DENSITE
Publication
Application
Priority
- US 2004030875 W 20040920
- US 66967103 A 20030923
Abstract (en)
[origin: US2005064729A1] The invention includes a method of filling gaps in a semiconductor substrate. A substrate and a gas mixture containing at least one heavy-hydrogen compound are provided within a reaction chamber. The gas mixture is reacted to form a layer of material over the substrate by simultaneous deposition and etch of the layer. The layer of material fills the gap such that the material within the gap is essentially void-free. The invention includes a method of providing improved deposition rate uniformity. A material is deposited over a surface in the presence of at least one gas selected from the group consisting of D2, HD, DT, T2 and TH. The net deposition rate during the deposition has a degree of variance across the surface which is measurably improved relative to a corresponding degree of variance that occurs during deposition utilizing H2 under otherwise substantially identical conditions.
IPC 1-7
IPC 8 full level
C23C 16/04 (2006.01); C23C 16/40 (2006.01); H01L 21/316 (2006.01); H01L 21/762 (2006.01); H01L 21/768 (2006.01)
CPC (source: EP KR US)
C23C 16/045 (2013.01 - EP KR US); C23C 16/401 (2013.01 - EP KR US); H01L 21/02126 (2013.01 - EP KR US); H01L 21/02164 (2013.01 - KR US); H01L 21/02211 (2013.01 - EP KR US); H01L 21/02274 (2013.01 - KR US); H01L 21/31612 (2016.02 - US); H01L 21/31625 (2016.02 - US); H01L 21/76224 (2013.01 - EP KR US); H01L 21/76837 (2013.01 - EP KR US); H01L 21/02129 (2013.01 - EP); H01L 21/02164 (2013.01 - EP); H01L 21/02274 (2013.01 - EP)
Citation (search report)
See references of WO 2005031841A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
US 2005064729 A1 20050324; US 7056833 B2 20060606; AT E537556 T1 20111215; CN 100454497 C 20090121; CN 1856870 A 20061101; EP 1665354 A2 20060607; EP 1665354 B1 20111214; JP 2007507111 A 20070322; JP 4356747 B2 20091104; KR 100759649 B1 20070917; KR 20060095972 A 20060905; TW 200524008 A 20050716; TW I248638 B 20060201; US 2005196976 A1 20050908; US 2006134924 A1 20060622; US 7202183 B2 20070410; US 7273793 B2 20070925; WO 2005031841 A2 20050407; WO 2005031841 A3 20050901
DOCDB simple family (application)
US 66967103 A 20030923; AT 04784663 T 20040920; CN 200480027564 A 20040920; EP 04784663 A 20040920; JP 2006528102 A 20040920; KR 20067005493 A 20060320; TW 93128729 A 20040922; US 11585405 A 20050425; US 2004030875 W 20040920; US 34119906 A 20060127