Global Patent Index - EP 1673826 A2

EP 1673826 A2 20060628 - MICROBATTERY WITH AT LEAST ONE ELECTRODE AND ELECTROLYTE EACH COMPRISING A COMMON GROUPING XY sb 1 /sb ,Y sb 2 /sb ,Y sb 3 / sb ,Y sb 4 /sb AND METHOD FOR THE PRODUCTION OF SAID MICRO BATTERY

Title (en)

MICROBATTERY WITH AT LEAST ONE ELECTRODE AND ELECTROLYTE EACH COMPRISING A COMMON GROUPING XY sb 1 /sb ,Y sb 2 /sb ,Y sb 3 / sb ,Y sb 4 /sb AND METHOD FOR THE PRODUCTION OF SAID MICRO BATTERY

Title (de)

MIKROBATTERIE MIT MINDESTENS EINER ELEKTRODE UND ELEKTROLYT JEWEILS MIT EINER GEMEINSAMEN GRUPPIERUNG VON XY SB 1 /SB ,Y SB 2 /SB ,Y SB 3 / SB ,Y SB 4 /SB UND VERFAHREN ZUR HERSTELLUNG DER MIKROBATTERIE

Title (fr)

MICROBATTERIE DONT AU MOINS UNE ELECTRODE ET L'ELECTROLYTE COMPORTENT CHACUN LE GROUPEMENT COMMUN XY sb 1 /sb ,Y sb 2 /sb ,Y sb 3 /sb ,Y sb 4 /sb ET PROCEDE DE FABRICATION D&rs quo;UNE TELLE MICROBATTERIE

Publication

EP 1673826 A2 20060628 (FR)

Application

EP 04817211 A 20041011

Priority

  • FR 2004002571 W 20041011
  • FR 0311998 A 20031014

Abstract (en)

[origin: FR2860925A1] Microbattery comprises a solid electrolyte (4) between a first electrode (5) and a second electrode (3), each in the form of a thin layer, where the first electrode and the electrolyte comprise a material with a tetrahedral structure in which a central atom of phosphorus, boron, silicon, sulfur, molybdenum, vanadium or germanium is bonded to four atoms of sulfur, oxygen, fluorine and/or chlorine. Microbattery comprises a solid electrolyte (4) between a first electrode (5) and a second electrode (3), each in the form of a thin layer, where the first electrode and the electrolyte comprise a material with a tetrahedral XY 1Y 2Y 3Y 4structure. X : P, B, Si, S, Mo, V or Ge; Y 1-Y 4S, O, F or Cl. An independent claim is also included for producing a microbattery as above by successively depositing thin layers on a substrate (Ia) using a sputtering target comprising a compound of type A x2T' y2[XY 1Y 2Y 3Y 4] z2B' w2and an element E' to form the second electrode, a sputtering target comprising the group [XY 1Y 2Y 3Y 4] to form the electrolyte and a sputtering target comprising a compound of type A x1T y1[XY 1Y 2Y 3Y 4] z1B w1and an element E to form the first electrode. A : alkali metal; T, T' : Ti, V, Cr, Co, Ni, Mn, Fe, Cu, Nb, Mo and/or W; B, B' : S, O, F or Cl; x1, w1, x2, w2 : 0 or more; y1, z1, y2, z2 : numbers greater than 0; E, E' : metals or carbon.

IPC 1-7

H01M 4/58

IPC 8 full level

H01M 4/131 (2010.01); H01M 4/134 (2010.01); H01M 4/48 (2010.01); H01M 4/485 (2010.01); H01M 4/50 (2010.01); H01M 4/505 (2010.01); H01M 4/52 (2010.01); H01M 4/525 (2010.01); H01M 10/052 (2010.01); H01M 10/0565 (2010.01); H01M 10/36 (2010.01); H01M 4/66 (2006.01)

CPC (source: EP US)

H01M 4/131 (2013.01 - EP US); H01M 4/134 (2013.01 - EP US); H01M 4/485 (2013.01 - EP US); H01M 4/505 (2013.01 - EP US); H01M 4/525 (2013.01 - EP US); H01M 10/052 (2013.01 - EP US); H01M 10/0565 (2013.01 - EP US); H01M 4/661 (2013.01 - EP US); Y02E 60/10 (2013.01 - EP); Y02P 70/50 (2015.11 - EP); Y10T 29/49115 (2015.01 - EP US)

Citation (search report)

See references of WO 2005038965A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

FR 2860925 A1 20050415; EP 1673826 A2 20060628; JP 2007508671 A 20070405; JP 4795244 B2 20111019; US 2007037059 A1 20070215; WO 2005038965 A2 20050428; WO 2005038965 A3 20060330

DOCDB simple family (application)

FR 0311998 A 20031014; EP 04817211 A 20041011; FR 2004002571 W 20041011; JP 2006534783 A 20041011; US 57451104 A 20041011