EP 1687842 A1 20060809 - RADICAL GENERATING METHOD, ETCHING METHOD AND APPARATUS FOR USE IN THESE METHODS
Title (en)
RADICAL GENERATING METHOD, ETCHING METHOD AND APPARATUS FOR USE IN THESE METHODS
Title (de)
RADIKALERZEUGUNGSVERFAHREN ÄTZVERFAHREN UND VORRICHTUNG ZUR VERWENDUNG BEI DIESEM VERFAHREN
Title (fr)
PROCEDE DE GENERATION DE RADICAUX, PROCEDE DE GRAVURE ET APPAREIL MIS EN OEUVRE DANS LESDITS PROCEDES
Publication
Application
Priority
- JP 2004016920 W 20041109
- JP 2003381583 A 20031111
Abstract (en)
[origin: WO2005045915A1] The method for generating radicals comprises: feeding F2 gas or a mixed gas of F2 gas and an inert gas into a chamber of which the inside is provided with a carbon material, supplying a carbon atom from the carbon material by applying a target bias voltage to the carbon material, and thereby generating high density radicals, wherein the ratio of CF3 radical, CF2 radical and CF radical is arbitrarily regulated by controlling the target bias voltage applied to the carbon material while measuring the infrared absorption spectrum of radicals generated inside the chamber.
IPC 8 full level
H01L 21/311 (2006.01)
CPC (source: EP US)
H01J 37/32082 (2013.01 - EP US); H01J 37/32706 (2013.01 - EP US); H01J 37/32972 (2013.01 - EP US); H01J 37/3405 (2013.01 - EP US); H01L 21/31116 (2013.01 - EP US); Y02C 20/30 (2013.01 - EP US); Y02P 70/50 (2015.11 - EP US)
Citation (search report)
See references of WO 2005045915A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2005045915 A1 20050519; CN 100490087 C 20090520; CN 1879200 A 20061213; EP 1687842 A1 20060809; TW 200522200 A 20050701; TW I346979 B 20110811; US 2007131651 A1 20070614; US 7875199 B2 20110125
DOCDB simple family (application)
JP 2004016920 W 20041109; CN 200480033076 A 20041109; EP 04799701 A 20041109; TW 93134313 A 20041110; US 57883504 A 20041109