Global Patent Index - EP 1711347 A2

EP 1711347 A2 20061018 - MICROREPLICATION OF TRANSITORY-IMAGE RELIEF PATTERN BASED OPTICALLY VARIABLE DEVICES

Title (en)

MICROREPLICATION OF TRANSITORY-IMAGE RELIEF PATTERN BASED OPTICALLY VARIABLE DEVICES

Title (de)

MIKROABFORMUNG VON OPTISCH VARIABLEN VORRICHTUNGEN AUF DER BASIS EINES TRANSIENTBILDRELIEFMUSTERS

Title (fr)

MICROREPLICATION DE DISPOSITIFS A VARIABILITE OPTIQUE BASES SUR DES MOTIFS EN RELIEF A IMAGE TRANSITOIRE

Publication

EP 1711347 A2 20061018 (EN)

Application

EP 05702756 A 20050124

Priority

  • IB 2005050264 W 20050124
  • CH 2004000070 W 20040206

Abstract (en)

[origin: WO2005074358A2] The invention concerns a method for the replication by hot-embossing, hot-stamping or plastic injection moulding of an optically variable transitory image relief pattern characterized by the use of a Silicon origination shim fabricated through a micromachining process. The invention also comprises objects and structures obtained according to said method.

IPC 8 full level

B42D 15/00 (2006.01); B81C 1/00 (2006.01)

CPC (source: EP)

B42D 25/29 (2014.10); B44C 1/227 (2013.01); B44F 1/10 (2013.01); B42D 25/324 (2014.10)

Citation (search report)

See references of WO 2005074358A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR LV MK YU

DOCDB simple family (publication)

WO 2005074358 A2 20050818; WO 2005074358 A3 20060921; AU 2005211226 A1 20050818; EP 1711347 A2 20061018

DOCDB simple family (application)

IB 2005050264 W 20050124; AU 2005211226 A 20050124; EP 05702756 A 20050124