EP 1716453 A2 20061102 - IMMERSION LITHOGRAPHY TECHNIQUE AND PRODUCT USING A PROTECTION LAYER COVERING THE RESIST
Title (en)
IMMERSION LITHOGRAPHY TECHNIQUE AND PRODUCT USING A PROTECTION LAYER COVERING THE RESIST
Title (de)
IMMERSIONSLITHOGRAPHIETECHNIK UND PRODUKT MIT EINER DAS RESIST ABDECKENDEN SCHUTZSCHICHT
Title (fr)
PROTECTION DE LA COUCHE PHOTOSENSIBLE POUR LITHOGRAPHIE À IMMERSION
Publication
Application
Priority
- EP 2005001511 W 20050215
- EP 04290429 A 20040217
- EP 05707399 A 20050215
Abstract (en)
[origin: EP1564592A1] In an immersion lithography method, the photoresist layer (20) is provided with a shield layer (30) to protect it from degradation caused by contact with the immersion liquid. The shield layer (30) is transparent at the exposure wavelength and is substantially impervious to (and, preferably, insoluble in) the immersion liquid. The shield layer (30) can be formed of a material which can be removed using the same developer as is used to develop the photoresist layer (20) after exposure. <IMAGE> <IMAGE> <IMAGE> <IMAGE>
IPC 8 full level
G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP KR US)
G03F 7/09 (2013.01 - KR); G03F 7/11 (2013.01 - EP KR US); G03F 7/20 (2013.01 - KR); G03F 7/2041 (2013.01 - EP US); G03F 7/70341 (2013.01 - EP US)
Citation (search report)
See references of WO 2005078525A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 1564592 A1 20050817; CN 101558357 A 20091014; EP 1716453 A2 20061102; JP 2007529881 A 20071025; KR 20060133976 A 20061227; TW 200538881 A 20051201; US 2008171285 A1 20080717; WO 2005078525 A2 20050825; WO 2005078525 A3 20051027
DOCDB simple family (application)
EP 04290429 A 20040217; CN 200580001379 A 20050215; EP 05707399 A 20050215; EP 2005001511 W 20050215; JP 2006552572 A 20050215; KR 20067009317 A 20060512; TW 94104674 A 20050217; US 59576205 A 20050215