EP 1721219 A2 20061115 - ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
Title (en)
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
Title (de)
BELEUCHTUNGSSYSTEM FÜR EINE MIKROLITHOGRAPHIE-PROJEKTIONSBELICHTUNGSANLAGE
Title (fr)
SYSTEME D'ECLAIRAGE POUR INSTALLATION D'EXPOSITION PAR PROJECTION MICROLITHOGRAPHIQUE
Publication
Application
Priority
- EP 2005001948 W 20050224
- DE 102004010569 A 20040226
Abstract (en)
[origin: WO2005083517A2] The invention relates to an illumination system for a microlithography projection exposure installation for illuminating an illumination field (7) with the light from an associated light source (10). Said system comprises at least one polarisation compensator (11) which is arranged in a pupil plane (23) of the illumination system and can be used to at least partially compensate a polarisation modification introduced by elements (5) which modify the polarisation according to the angle. Said polarisation compensator (11) comprises polarisation modification means for modifying the polarisation according to the location, said means being embodied as double-refractive elements or elements comprising a double-refractive structure. Such a polarisation compensation can improve the transmission characteristics of the microlithography projection exposure installation, especially when using a downstream projection objective with a physical beam splitter.
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP KR US)
G02B 5/30 (2013.01 - KR); G03F 7/70191 (2013.01 - KR); G03F 7/70566 (2013.01 - EP KR US)
Citation (search report)
See references of WO 2005083517A2
Designated contracting state (EPC)
DE NL
Designated extension state (EPC)
AL BA HR LV MK YU
DOCDB simple family (publication)
DE 102004010569 A1 20050915; EP 1721219 A2 20061115; JP 2007524247 A 20070823; KR 20060123589 A 20061201; US 2007263199 A1 20071115; WO 2005083517 A2 20050909; WO 2005083517 A3 20060413
DOCDB simple family (application)
DE 102004010569 A 20040226; EP 05715516 A 20050224; EP 2005001948 W 20050224; JP 2007500157 A 20050224; KR 20067017080 A 20060824; US 59070005 A 20050224