EP 1746178 A3 20070912 - Device for improving plasma activity in PVD-reactors
Title (en)
Device for improving plasma activity in PVD-reactors
Title (de)
Vorrichtung zur Verbesserung der Plasma-Wirksamkeit in PVD-Reaktoren
Title (fr)
Dispositf pour l'amélioration de l'activité du plasma dans les réacteurs PVD
Publication
Application
Priority
SE 0501717 A 20050722
Abstract (en)
[origin: EP1746178A2] The present invention relates to a device for improving plasma activity in a magnetron sputtering reactor containing substrates to be coated where a primary plasma is created by a DC or AC voltage applied between the substrates and an additional electrode. Increased plasma activity is obtained by thermionic emission of electrons from a hot filament heated by either DC or AC current or combinations thereof. The device is particularly useful for increasing the adhesion of layers deposited by magnetron sputtering on cutting tool inserts made of cemented carbide, high speed steels, cermets, ceramics or cubic boron nitride.
IPC 8 full level
C23C 14/02 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01)
CPC (source: EP KR SE US)
C23C 14/022 (2013.01 - EP KR SE US); C23C 14/3478 (2013.01 - SE); C23C 14/355 (2013.01 - EP KR SE US); H01J 37/3233 (2013.01 - EP KR US); H01J 37/3405 (2013.01 - EP KR US)
Citation (search report)
- [X] US 6153061 A 20001128 - TZENG YONHUA [US], et al
- [X] US 5840167 A 19981124 - KIM BYEONG-CHAN [KR]
- [X] US 2003143868 A1 20030731 - YAMAGUCHI HIROHITO [JP], et al
- [X] US 2005034667 A1 20050217 - TSUJI NAOTO [JP], et al
- [DA] US 5294322 A 19940315 - VETTER JOERG [DE], et al
- [X] CHINN J D: "ION BEAM ENHANCED MAGNETRON REACTIVE ION ETCHING", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 51, no. 24, 14 December 1987 (1987-12-14), pages 2007 - 2009, XP000046333, ISSN: 0003-6951
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
EP 1746178 A2 20070124; EP 1746178 A3 20070912; EP 1746178 B1 20130807; CN 1900354 A 20070124; CN 1900354 B 20110803; IL 176658 A0 20080120; JP 2007035623 A 20070208; KR 20070012275 A 20070125; SE 0501717 L 20070123; SE 529375 C2 20070724; US 2007017804 A1 20070125
DOCDB simple family (application)
EP 06445051 A 20060620; CN 200610105750 A 20060721; IL 17665806 A 20060702; JP 2006194631 A 20060714; KR 20060068728 A 20060721; SE 0501717 A 20050722; US 49050206 A 20060721