EP 1760530 A1 20070307 - Lithographic apparatus and device manufacturing method
Title (en)
Lithographic apparatus and device manufacturing method
Title (de)
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
Title (fr)
Appareil lithographique et procédé de fabrication d'un dispositif
Publication
Application
Priority
US 21512305 A 20050831
Abstract (en)
A lithographic apparatus operable in a substrate exposing configuration to expose a substrate with a pattern of radiation and a radiation beam inspection configuration in which the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration is inspected by a radiation beam inspection device. In the radiation beam inspecting configuration, the operation of the lithographic apparatus is modified in order to minimize the difference between the pattern of radiation exposed on the substrate and the required pattern of radiation to be exposed on the substrate.
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP KR US)
G03F 7/2051 (2013.01 - KR); G03F 7/70375 (2013.01 - EP KR US); G03F 7/7055 (2013.01 - KR); G03F 7/706 (2013.01 - KR); G03F 7/70666 (2013.01 - EP KR US); G03F 7/706847 (2023.05 - KR); G03F 7/70716 (2013.01 - KR); G03F 7/7085 (2013.01 - KR)
Citation (search report)
- [X] US 6515272 B1 20030204 - FONTAINE BRUNO LA [US], et al
- [X] US 2002087943 A1 20020704 - ASANO MASAFUMI [JP], et al
- [X] US 2003099026 A1 20030529 - SANDSTROM TORBJORN [SE]
- [PX] WO 2005106594 A2 20051110 - ADVANCED MICRO DEVICES INC [US], et al
- [PX] US 2006146309 A1 20060706 - HULT DAVID A [US]
Designated contracting state (EPC)
DE FR GB IT NL
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
EP 1760530 A1 20070307; EP 1760530 B1 20111012; CN 102566324 A 20120711; CN 102566324 B 20160914; CN 1975579 A 20070606; CN 1975579 B 20120704; JP 2007065668 A 20070315; JP 5112662 B2 20130109; KR 100806826 B1 20080222; KR 20070026213 A 20070308; SG 130174 A1 20070320; TW 200717187 A 20070501; TW I347497 B 20110821; US 2007046917 A1 20070301; US 2009219500 A1 20090903; US 8937705 B2 20150120
DOCDB simple family (application)
EP 06254320 A 20060817; CN 200610064737 A 20060830; CN 201210063976 A 20060830; JP 2006232960 A 20060830; KR 20060083781 A 20060831; SG 2006058937 A 20060828; TW 95130343 A 20060818; US 21512305 A 20050831; US 43700909 A 20090507