EP 1767068 B1 20090826 - DEVICE FOR THE TREATMENT OF A SUBSTRATE BY MEANS OF AT LEAST ONE PLASMA JET
Title (en)
DEVICE FOR THE TREATMENT OF A SUBSTRATE BY MEANS OF AT LEAST ONE PLASMA JET
Title (de)
VORRICHTUNG ZUR BEARBEITUNG EINES SUBSTRATES MITTELS MINDESTENS EINES PLASMA-JETS
Title (fr)
DISPOSITIF POUR TRAITER UN SUBSTRAT AU MOYEN D'AU MOINS UN JET DE PLASMA
Publication
Application
Priority
- DE 2005001015 W 20050608
- DE 102004029081 A 20040616
Abstract (en)
[origin: WO2005125286A2] The invention relates to a device (10) for treating a substrate (11) with the aid of at least one plasma jet (13). Said device comprises a receptacle (15) through which a carrier gas flows along a certain direction of flow (x), a first electrode (17), and a second electrode (18). The inventive device is characterized in that the two electrodes (17, 18) are separated from each other by means of at least one dielectric barrier (15) while an alternating voltage is applied between the electrodes (17, 18) in order to create an atmospheric pressure glow discharge plasma. Furthermore, the first electrode (17) is axially (L) and radially (R) spaced apart from the second electrode (18) relative to the direction of flow (x) of the carrier gas.
IPC 8 full level
CPC (source: EP US)
H05H 1/2406 (2013.01 - EP US); H05H 1/246 (2021.05 - EP); H05H 1/44 (2013.01 - EP)
Designated contracting state (EPC)
BE DE DK GB IE NL
DOCDB simple family (publication)
WO 2005125286 A2 20051229; WO 2005125286 A3 20060803; DE 102004029081 A1 20060105; DE 502005007992 D1 20091008; EP 1767068 A2 20070328; EP 1767068 B1 20090826
DOCDB simple family (application)
DE 2005001015 W 20050608; DE 102004029081 A 20040616; DE 502005007992 T 20050608; EP 05753782 A 20050608