EP 1774055 A2 20070418 - ION IMPLANTER OPERATING IN PULSED PLASMA MODE
Title (en)
ION IMPLANTER OPERATING IN PULSED PLASMA MODE
Title (de)
IN GEPULSTEM PLASMA-MODUS FUNKTIONIERENDE IONEN-IMPLANTIERUNGSVORRICHTUNG
Title (fr)
IMPLANTEUR IONIQUE FONCTIONNANT EN MODE PLASMA PULSE
Publication
Application
Priority
- FR 2005001468 W 20050614
- FR 0406496 A 20040616
Abstract (en)
[origin: WO2006003322A2] The invention relates to an ion implanter (IMP) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate. The inventive implanter also comprises a capacitor C which is connected directly to the earth (E) and which is mounted downstream of the plate power supply (ALT). The invention also relates to a method of using said implanter.
IPC 8 full level
C23C 14/48 (2006.01); C23C 8/36 (2006.01); C23C 16/00 (2006.01); H01J 37/32 (2006.01)
CPC (source: EP US)
C23C 8/36 (2013.01 - EP US); C23C 14/48 (2013.01 - EP US); H01J 37/32412 (2013.01 - EP US); H01J 37/32706 (2013.01 - EP US)
Citation (search report)
See references of WO 2006003322A2
Citation (examination)
- EP 1111084 A1 20010627 - AXCELIS TECH INC [US]
- US 4937205 A 19900626 - NAKAYAMA ICHIRO [JP], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
FR 2871812 A1 20051223; FR 2871812 B1 20080905; BR PI0512247 A 20080219; CN 1989269 A 20070627; EP 1774055 A2 20070418; US 2008315127 A1 20081225; WO 2006003322 A2 20060112; WO 2006003322 A3 20060601
DOCDB simple family (application)
FR 0406496 A 20040616; BR PI0512247 A 20050614; CN 200580024715 A 20050614; EP 05777129 A 20050614; FR 2005001468 W 20050614; US 62969005 A 20050614