EP 1774538 A4 20120606 - MULTIPLE GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS
Title (en)
MULTIPLE GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS
Title (de)
MULTIPLES GASINJEKTIONSSYSTEM FÜR STRAHLINSTRUMENTE GELADENER TEILCHEN
Title (fr)
SYSTEME D'INJECTION DE GAZ A ELEMENTS MULTIPLES POUR INSTRUMENTS A FAISCEAU DE PARTICULES CHARGEES
Publication
Application
Priority
- US 2005025906 W 20050721
- US 59210304 P 20040729
Abstract (en)
[origin: US2006022136A1] We disclose a gas injection system having at least one crucible, each crucible holding at least one deposition constituent; at least one transfer tube, the number of transfer tubes corresponding to the number of crucibles, each transfer tube being connected to a corresponding crucible. There is at least one metering valve, the number of metering valves corresponding to the number of transfer tubes, each metering valve being connected to a corresponding transfer tube so that the metering valve can measure and adjust vapor flow in the corresponding transfer tube. A sensor is provided capable of sensing reactions between deposition constituents and a focused ion beam A computer is connected to receive the output of the sensor; the computer is also connected to each metering valve to control the operation of the valve, and the computer is programmed to send control signals to each metering valve to control the operation of the valve; the control signals being computed responsive to feedback from the output of the sensor.
IPC 8 full level
C23C 16/48 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01)
CPC (source: EP US)
G21K 7/00 (2013.01 - EP US); H01J 37/3056 (2013.01 - EP US); H01J 37/3178 (2013.01 - EP US); H01J 2237/006 (2013.01 - EP US); H01J 2237/30411 (2013.01 - EP US); H01J 2237/30455 (2013.01 - EP US); H01J 2237/31 (2013.01 - EP US); H01J 2237/31744 (2013.01 - EP US)
Citation (search report)
- [A] EP 0199585 A2 19861029 - SEIKO INSTR & ELECTRONICS [JP]
- [A] WO 9738355 A1 19971016 - MICRION CORP [US]
- [A] US 6440615 B1 20020827 - SHIMIZU SUMITO [JP]
- [A] US 5683547 A 19971104 - AZUMA JUNZOU [JP], et al
- [A] DE 10208043 A1 20030911 - LEO ELEKTRONENMIKROSKOPIE GMBH [DE], et al
- [A] WO 03065132 A2 20030807 - TOKYO ELECTRON LTD [JP], et al
- [A] US 5055696 A 19911008 - HARAICHI SATOSHI [JP], et al
- [A] US 6414307 B1 20020702 - GERLACH ROBERT L [US], et al
- [A] EP 0838836 A2 19980429 - SCHLUMBERGER TECHNOLOGIES INC [US]
- See references of WO 2006025968A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
US 2006022136 A1 20060202; EP 1774538 A2 20070418; EP 1774538 A4 20120606; WO 2006025968 A2 20060309; WO 2006025968 A3 20070614
DOCDB simple family (application)
US 18670605 A 20050721; EP 05810798 A 20050721; US 2005025906 W 20050721