EP 1779971 A1 20070502 - Pad conditioner for conditioning a CMP pad and method of making such a pad conditioner
Title (en)
Pad conditioner for conditioning a CMP pad and method of making such a pad conditioner
Title (de)
Vorrichtung zum Abrichten eines CMP-Polierkissens und Verfahrung zur Herstellung einer derartigen Vorrichtung
Title (fr)
Appareil de dressage pour tampon de polissage mécano-chimique et son procédé de fabrication
Publication
Application
Priority
EP 05023680 A 20051028
Abstract (en)
The invention provides a pad conditioner for conditioning a CMP pad. The pad conditioner includes a substrate, a plurality of cavities on the substrate, a bonding agent filling in the cavities, and a plurality of abrasive particles securely placed and fixed in the cavities separately. The cavities are arranged in a regular manner and each cavity is sized such that it can accommodate only one abrasive particle. The cavities may be bowl-shaped or of other shapes. A method of making such a pad conditioner is also disclosed.
IPC 8 full level
B24B 37/04 (2006.01); B24B 53/017 (2012.01); B24B 53/12 (2006.01); B24D 3/06 (2006.01); B24D 18/00 (2006.01)
CPC (source: EP)
B24B 53/017 (2013.01); B24B 53/12 (2013.01); B24D 3/06 (2013.01); B24D 18/00 (2013.01); B24D 2203/00 (2013.01)
Citation (search report)
- [AD] US 6368198 B1 20020409 - SUNG CHIEN-MIN [TW], et al
- [A] US 6419574 B1 20020716 - TAKAHASHI TSUTOMU [JP], et al
- [A] DE 9107089 U1 19910822
- [A] US 2002197947 A1 20021226 - SAGAWA MASAYUKI [JP]
Citation (examination)
- US 4155721 A 19790522 - FLETCHER J LAWRENCE [US]
- US 5669943 A 19970923 - HORTON M DUANE [US], et al
- DE 2438600 A1 19760226 - WINTER & SOHN ERNST
Designated contracting state (EPC)
CH DE FR GB IE LI NL
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
DOCDB simple family (application)
EP 05023680 A 20051028