Global Patent Index - EP 1780766 A1

EP 1780766 A1 20070502 - Magnetron sputtering system for large-area substrates having removable anodes

Title (en)

Magnetron sputtering system for large-area substrates having removable anodes

Title (de)

Magnetron Zerstäubungssystem für grossflächige Substrate mit abnehmbaren Anoden

Title (fr)

Système de pulvérisation magnétron pour substrats de grande surface ayant des anodes amovibles

Publication

EP 1780766 A1 20070502 (EN)

Application

EP 07001496 A 20051220

Priority

  • EP 05027887 A 20051220
  • US 69942805 P 20050713
  • US 24743805 A 20051011
  • US 24770505 A 20051011

Abstract (en)

The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the anode assembly contains a conductive member and conductive member support. In one aspect, the processing chamber is adapted to allow the conductive member to be removed from the processing chamber without removing any major components from the processing chamber.

IPC 8 full level

H01J 37/34 (2006.01)

CPC (source: EP)

H01J 37/32697 (2013.01); H01J 37/3408 (2013.01); H01J 37/3438 (2013.01); H01J 37/3447 (2013.01)

Citation (search report)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR MK YU

DOCDB simple family (publication)

EP 1780766 A1 20070502

DOCDB simple family (application)

EP 07001496 A 20051220